Method for making an epitaxial germanium temperature sensor
First Claim
1. A method for making an epitaxial germanium temperature sensor, comprising:
- depositing an epitaxial germanium layer onto a substrate by chemical vapor deposition CVD); and
doping the layer during the vapor phase of the CVD process to a dopant concentration selected so that at temperatures below about 4K, resistivity of the layer is due to hopping conduction of free carriers.
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Abstract
A method of making a highly sensitive epitaxial germanium low temperature sensor that is superior in the method of production and performance than those currently available. The geometry and sensitivity of the sensor can be tuned to desired temperature ranges, and specifically can operate at cryogenic temperatures. The sensor can be manufactured uniformly and reproducibly in large quantities at relatively low cost in which large area arrays are possible. The applications of the sensors range from conventional low temperature thermometry and control in laboratory and industrial settings, to applications associated with infrared, x-ray, particle and plasma physics and spectroscopy.
28 Citations
13 Claims
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1. A method for making an epitaxial germanium temperature sensor, comprising:
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depositing an epitaxial germanium layer onto a substrate by chemical vapor deposition CVD); and
doping the layer during the vapor phase of the CVD process to a dopant concentration selected so that at temperatures below about 4K, resistivity of the layer is due to hopping conduction of free carriers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification