Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- a radiation system configured to provide a beam of radiation;
a support structure configured to support a patterning device adapted to impart a desired pattern to the beam of radiation;
a substrate holder configured to hold a substrate;
a projection system that projects the patterned beam onto a target portion of the substrate; and
an actuator configured to position at least one part within the radiation system, the support structure, the substrate holder, or the projection system, the actuator comprising a coil arrangement in thermal contact with at least one cooling element, said at least one cooling element being provided with one or more slits configured to increase electrical resistance of eddy current paths.
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Abstract
Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.
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Citations
21 Claims
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1. A lithographic apparatus, comprising:
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a radiation system configured to provide a beam of radiation;
a support structure configured to support a patterning device adapted to impart a desired pattern to the beam of radiation;
a substrate holder configured to hold a substrate;
a projection system that projects the patterned beam onto a target portion of the substrate; and
an actuator configured to position at least one part within the radiation system, the support structure, the substrate holder, or the projection system, the actuator comprising a coil arrangement in thermal contact with at least one cooling element, said at least one cooling element being provided with one or more slits configured to increase electrical resistance of eddy current paths. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A device manufacturing method, comprising:
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providing a substrate held by a substrate holder;
providing a beam of radiation using an illumination system;
imparting a desired pattern onto the beam of radiation by a patterning device supported by a support structure;
projecting the patterned beam of radiation onto a target portion of the substrate via a projection system; and
positioning at least a part of one of the radiation system, the support structure, the substrate holder, and the projection system by an actuator, the actuator comprising a coil arrangement in thermal contact with at least one cooling element, wherein the cooling element is provided with one or more slits configured to increase electrical resistance of eddy current paths.
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12. A lithographic actuating mechanism, comprising:
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a magnet assembly;
at least one cooling element; and
a coil arrangement in thermal contact with said at least one cooling element;
said at least one cooling element being provided with one or more slits configured to increase electrical resistance of eddy current paths. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification