Organic field effect transistor with a photostructured gate dielectric, method for the production and use thereof in organic electronics
First Claim
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1. Organic field effect transistor, characterized in that there are disposed on a flexible substrate (1), in a first layer, source and drain electrodes (2, 2′
- ) as well as a semiconductor (3) on which, in a second layer, an insulator (4) is pattern-formed and on which, in a third layer, a gate electrode (5) is deposited.
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Abstract
The invention relates to an organic field effect transistor which is especially characterized by a cross-linked, structured insulating layer (4) on which the gate electrode (5) is arranged. The structure of the OFET ensures that the gate electrode (5) of an OFET can be used as a strip conductor to the source electrode (2) of the next transistor and can be used in the construction of larger circuits.
64 Citations
20 Claims
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1. Organic field effect transistor, characterized in that there are disposed on a flexible substrate (1), in a first layer, source and drain electrodes (2, 2′
- ) as well as a semiconductor (3) on which, in a second layer, an insulator (4) is pattern-formed and on which, in a third layer, a gate electrode (5) is deposited.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 16, 17, 18, 19, 20)
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11. Method for producing an organic field effect transistor wherein a flexible substrate (1) is provided with a source and drain electrode (2, 2′
- ) as well as a semiconductor (3) in the usual manner, characterized in that an insulator (4) is deposited on the semiconductor (3) by applying an insulator material solution containing an acid-sensitive crosslinker as well as a photoinitiator, exposing it through a shadow mask covering the source and drain electrodes (2, 2′
), and then baking it, crosslinking being effected at the exposed areas and the gate electrode (5) being deposited on the thus crosslinked and patterned insulator (4). - View Dependent Claims (12, 13, 14, 15)
- ) as well as a semiconductor (3) in the usual manner, characterized in that an insulator (4) is deposited on the semiconductor (3) by applying an insulator material solution containing an acid-sensitive crosslinker as well as a photoinitiator, exposing it through a shadow mask covering the source and drain electrodes (2, 2′
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