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Reactor surface passivation through chemical deactivation

  • US 20040221807A1
  • Filed: 05/07/2004
  • Published: 11/11/2004
  • Est. Priority Date: 05/09/2003
  • Status: Active Grant
First Claim
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1. A method of treating and operating a reaction space surface of a vapor deposition reactor, comprising:

  • treating the reaction space surface with a treatment chemical, thereby deactivating the reaction space surface against reaction with a plurality of deposition reactants;

    loading a substrate into the reaction space after treating; and

    depositing a layer on the substrate by exposing the substrate to the plurality of reactants.

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