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Lithographic apparatus and device manufacturing method

  • US 20040227107A1
  • Filed: 03/23/2004
  • Published: 11/18/2004
  • Est. Priority Date: 04/04/2003
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a radiation system configured to provide a beam of radiation;

    a support structure configured to support a patterning device that imparts said beam of radiation with a desired pattern;

    a substrate holder configured to hold a substrate;

    a projection system configured to project said patterned beam of radiation onto a target portion of said substrate; and

    a positioning system configured to maintain at least a first optical element and a second optical element in predetermined positions, said at least first and second optical elements being disposed in said radiation system and/or said illumination system, said positioning system comprising;

    at least one position sensor that directly measures a relative position of at least said first optical element relative to said second optical element, wherein said positioning system maintains said first and second optical elements in a predetermined relative position.

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