Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof
First Claim
1. A transfer apparatus for transferring an object, comprising:
- a gripper for at least one of (a) gripping the object at a first position and releasing said object at a second position proximate to a receiver and (b) releasing said object at a first position after gripping said object at a second position proximate to said receiver;
a measurement device configured to measure a relative position of said gripper with respect to said receiver in at least one direction, wherein a relative position error is determined with respect to a desired relative position based on the measured relative position and the relative position of the gripper and said receiver is adjusted based on the reduction of the relative position error in the second position.
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Accused Products
Abstract
The invention relates to a transfer apparatus for transferring an object. The transfer apparatus comprises a gripper for either gripping the object at a first position and then releasing the object at a second position proximate to a receiving structure or releasing the object at a first position after gripping the object at a second position proximate to the receiver structure. The transfer apparatus also includes a measurement device arranged to measure the relative position of the gripper with respect to the receiving structure in at least one dimension. Further, a relative position error is determined with respect to a desired relative position based on the relative position measured. The relative position of the gripper and receiving structure are adjusted in order to minimize the relative position error in the second position.
19 Citations
33 Claims
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1. A transfer apparatus for transferring an object, comprising:
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a gripper for at least one of (a) gripping the object at a first position and releasing said object at a second position proximate to a receiver and (b) releasing said object at a first position after gripping said object at a second position proximate to said receiver;
a measurement device configured to measure a relative position of said gripper with respect to said receiver in at least one direction, wherein a relative position error is determined with respect to a desired relative position based on the measured relative position and the relative position of the gripper and said receiver is adjusted based on the reduction of the relative position error in the second position. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 20, 21, 23, 24, 25, 26, 27, 28, 29, 30)
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13. A lithographic apparatus, comprising:
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a radiation system configured to provide a beam of radiation;
a support structure configured to support a patterning device that imparts said beam of radiation with a desired pattern;
a substrate holder configured to hold a substrate;
a projection system configured to project said patterned beam of radiation onto a target portion of said substrate; and
a transfer apparatus for transferring said patterning device, wherein said transfer apparatus comprises;
a gripper for at least one of (a) gripping said patterning device at a first position and releasing said patterning device at a second position proximate to said support structure and (b) releasing said patterning device at a first position after gripping said patterning device at a second position proximate to said support structure, and a measurement device configured to measure a relative position of said gripper with respect to said support structure in at least one direction, wherein a relative position error is determined with respect to a desired relative position based on the measured relative position and the relative position of said gripper and said support structure is adjusted based on the reduction of the relative position error in the second position.
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22. A lithographic apparatus, comprising:
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a radiation system configured to provide a beam of radiation;
a support structure configured to support a patterning device that imparts said beam of radiation with a desired pattern;
a substrate holder configured to hold a substrate;
a projection system configured to project said patterned beam of radiation onto a target portion of said substrate; and
a transfer apparatus for transferring said patterning device, wherein said transfer apparatus comprises;
a gripper for at least one of (a) gripping said substrate at a first position and releasing said substrate at a second position proximate to said substrate holder and (b) releasing said substrate at a first position after gripping said substrate at a second position proximate to said substrate holder, and a measurement device configured to measure a relative position of said gripper with respect to said substrate holder in at least one direction, wherein a relative position error is determined with respect to a desired relative position based on the measured relative position and the relative position of said gripper and said substrate holder is adjusted based on the reduction of the relative position error in the second position.
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31. A method of transferring an object via a gripping device, said method comprising:
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gripping with said gripping device at least one of said object at a first position and releasing said object at a second position proximate to a receiving structure and releasing said object at a first position after gripping said object at a second position proximate to said receiving structure;
measuring a relative position of said gripping device with respect to said receiving structure in at least one direction;
determining a relative position error with respect to a desired relative position based on the measure relative position, and adjusting relative position of said gripping device and said receiving structure to minimize the relative position error in the second position.
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32. A device manufacturing method, comprising:
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providing a beam of radiation using a radiation system;
imparting a desired pattern onto said beam of radiation by a patterning device;
providing a substrate that is held by a substrate holder;
transferring said substrate between a first position and a second position situated proximate to said substrate holder via a gripping device, said transferring including;
gripping said substrate at a first position and releasing said substrate at the second position or releasing said substrate at a first position after gripping said substrate at a second position;
measuring a relative position of said gripping device with respect to said substrate holder in at least one direction;
determining a relative position error with respect to a desired relative position based on the measure relative position, and adjusting relative position of said gripping device and said substrate holder to minimize the relative position error, and projecting said patterned beam of radiation onto a target portion of said substrate.
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33. A device manufacturing method, comprising:
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providing a substrate;
providing a beam of radiation using a radiation system;
imparting a desired pattern onto said beam of radiation by a patterning device, said patterning device being supported by a support structure;
transferring said patterning device between a first position and a second position situated proximate to said support structure via a gripping device, said transferring including;
gripping said patterning device at a first position and releasing said patterning device at the second position or releasing said patterning device at a first position after gripping said substrate at a second position;
measuring a relative position of said gripping device with respect to said support structure in at least one direction;
determining a relative position error with respect to a desired relative position based on the measure relative position, and adjusting relative position of said gripping device and said support structure to minimize the relative position error, projecting said patterned beam of radiation onto a target portion of said substrate.
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Specification