Apparatus and methods for detecting overlay errors using scatterometry

• US 20040233439A1
• Filed: 02/23/2004
• Published: 11/25/2004
• Est. Priority Date: 02/22/2003
• Status: Active Grant

• Current Assignee: Kla-Tencor Technologies Corporation (KLA Corporation)
• Original Assignee: Kla-Tencor Technologies Corporation (KLA Corporation)
• Inventors: Fielden, John, Fabrikant, Anatoly, Levy, Ady, Friedmann, Michael, Smith, Ian, Adel, Michael E., Mieher, Walter D., Ghinovker, Mark, Bareket, Noah, Golovanevsky, Boris
• Granted Patent: US 7,298,481 B2
• Time in Patent Office: Days
• US Class Current: 356/401
• CPC Class Codes: G01N 2021/213 Spectrometric ellipsometry
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: G03F 7/70683 Mark designs
• CPC Class Codes: G03F 9/7049 Technique, e.g. interferometric
• CPC Class Codes: G03F 9/7084 Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.

Claims

1. A method of determining an overlay error between two layers of a multiple layer sample, the method comprising:

for each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, measuring a plurality of optical signals at a plurality of incident angles, wherein there are predefined offsets between the first and second structures; and

determining an overlay error between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.

2. A method as recited in claim 1, wherein the plurality of measured optical signals for each target are obtained simultaneously.

3. A method as recited in claim 2, wherein the plurality of measured optical signals for each target are obtained simultaneously by a simultaneous, multiple angle of incidence ellipsometer.

4. A method as recited in claim 3, wherein the ellipsometer includes a plurality of detector elements that are each arranged to detect a one of the plurality of measured optical signals for each target.

5. A method as recited in claim 1, further comprising comparing the measured optical signals to theoretical data to thereby obtain parameters of the periodic targets.

6. A method as recited in claim 1, further comprising comparing the measured optical signals to theoretical data to thereby adjust the model used to generate the theoretical data.

7. A method as recited in claim 2, wherein the plurality of measured optical signals for each target are obtained simultaneously by a beam profile reflectometer.

8. A method as recited in claim 2, wherein the plurality of measured optical signals for each target are obtained simultaneously by an Optical Fourier Transform reflectometer.

9. A method as recited in claim 2, wherein the plurality of measured optical signals for each target are obtained simultaneously by an Optical Fourier Transform ellipsometer.

10. A method as recited in claim 2, wherein the plurality of measured optical signals for each target are obtained simultaneously by an Optical Fourier Transform polarized reflectometer.

11. A method as recited in claim 1, wherein each first structure has a first center of symmetry and each second structure has a second center of symmetry and wherein the first center of symmetry and the second center of symmetry for each target are offset with respect to each other by a selected one of the predefined offsets.

12. A method as recited in claim 1, wherein the overlay error is determined without comparing the measured optical signals to calibration data.

13. A method as recited in claim 1, wherein the scatterometry overlay technique is a linear based technique.

14. A method as recited in claim 1, wherein the scatterometry overlay technique is a phase based technique.