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PLASMA APPARATUS, GAS DISTRIBUTION ASSEMBLY FOR A PLASMA APPARATUS AND PROCESSES THEREWITH

  • US 20040238123A1
  • Filed: 05/22/2003
  • Published: 12/02/2004
  • Est. Priority Date: 05/22/2003
  • Status: Active Grant
First Claim
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1. An axial flow downstream plasma treatment device for treating a substrate, comprising, in combination:

  • a gas source;

    a plasma generating component in fluid communication with the gas source, the plasma generating component comprising a plasma tube and a plasma generator coupled to the plasma tube for generating a plasma within the plasma tube from the gas source;

    a process chamber in fluid communication with the plasma tube comprising a baffle plate assembly about an inlet of the process chamber, wherein the baffle plate assembly comprises a generally planar upper baffle plate fixedly positioned above a generally planar lower baffle plate, the lower baffle plate comprising a plurality of apertures disposed about a central axis, wherein a dimension of each one of the plurality of apertures increases from the central axis to an outer edge of the lower baffle plate, and wherein the baffle plate assembly is positioned generally parallel to the substrate; and

    an exhaust conduit centrally located in a bottom wall of the process chamber.

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