Generation of pattern data free from any overlapping or excessive separation of dot patterns adjacent to each other
First Claim
1. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:
- coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and
pattern generation means for arranging said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.
3 Assignments
0 Petitions
Accused Products
Abstract
A device is disclosed for generating pattern data for unevenness that is randomly arranged on the surface of the reflective substrate of a reflective liquid crystal display device. The number of coordinates, a basic pitch, a movable range, and a dot diameter are entered from a data entry unit. An array generation unit regularly arranges base coordinates in two dimensions in accordance with the basic pitch. Coordinate displacement unit randomly displaces within the movable range at a portion of the basic coordinates to generate a multiplicity of displaced coordinates. Pattern generation unit arranges dot patterns with the dot diameter entered at each of the displaced coordinates generated to generate pattern data.
-
Citations
60 Claims
-
1. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:
-
coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and
pattern generation means for arranging said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.
-
-
2. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:
-
coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and
pattern generation means for arranging predetermined dot patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.
-
-
3. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:
-
coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and
pattern generation means for arranging predetermined line patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data. - View Dependent Claims (11, 13)
-
-
4. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:
-
data entry means for entering a basic pitch, a movable range, and a dot diameter;
array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;
coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and
pattern generation means for arranging a dot pattern with said dot diameter at each of the multiplicity of said displaced coordinates generated by said coordinate displacement means to generate pattern data. - View Dependent Claims (7, 9, 14)
-
-
5. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:
-
data entry means for entering a basic pitch, a movable range, and a line width;
array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;
coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and
pattern generation means for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said coordinate displacement means to generate pattern data. - View Dependent Claims (6, 8, 10, 12)
-
-
15. A computer program for causing a computer to execute processes for generating pattern data, said computer program comprising:
-
a first command set for entering a basic pitch, a movable range, and a dot diameter;
a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;
a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and
a fourth command set for arranging dot patterns with said dot diameter at least a portion of the multiplicity of said displaced coordinates generated by said third command set.
-
-
16. A computer program for causing a computer to execute processes for generating pattern data;
- said computer program comprising;
a first command set for entering a pitch, a movable range, and a line width; and
a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;
a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and
a fourth command set for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said third command set to generate a pattern data.
- said computer program comprising;
-
17. A photomask fabrication device for fabricating, in accordance with pattern data, a photomask for use in photoetching, said device comprising:
-
a pattern generator, that generates pattern data;
pattern entry means for entering the pattern data generated by said pattern generator;
mask material securing means for securing mask material in a predetermined position; and
pattern forming means for forming either light transmitting portions or light blocking portions according to said pattern data on said mask material secured by said mask material securing means. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41)
-
-
18. A photomask for use in photoetching;
wherein either a light transmitting portion or a light blocking portion is formed with a dot pattern with a dot diameter at each of a multiplicity of displaced coordinates that are derived by randomly displacing within a movable range at least a portion of a multiplicity of base coordinates regularly arranged in accordance with a basic pitch.
-
19. A photomask for use in photoetching;
wherein either a light transmitting portion or a light blocking portion is formed with a line pattern with a line width on each side of a plurality of polygons that take as vertices at least a portion of a multiplicity of displaced coordinates that are derived by randomly displacing within a movable range at least a portion of a multiplicity of base coordinates regularly arranged in accordance with a basic pitch.
-
20. A photomask for use in photoetching, wherein either a light transmitting portion or a light blocking portion is formed with a line pattern with a predetermined line width at each side of a multiplicity of hexagons that have been regularly arranged.
-
21. A reflector fabrication device for forming unevenness on the reflecting surface of a reflector by photoetching, said device comprising:
-
a photomask;
member securing means for securing a base member in a predetermined position;
member etching means for photoetching with said photomask at least a portion of the surface of said base member secured by said member securing means to form unevenness; and
metal film forming means for forming a metal thin film on the surface of said base member on which said unevenness formed by said member etching means to fabricate said reflector. - View Dependent Claims (42, 43, 44)
-
-
22. A reflector fabrication device for forming unevenness on the reflecting surface of a reflector in accordance with pattern data, said device comprising:
-
a pattern generator, that generates pattern data;
pattern entry means for entering pattern data generated either by said pattern generator or by said computer program;
member securing means for securing said reflector in a predetermined position; and
pattern forming means for forming either depressions or protrusions in accordance with said pattern data on the surface of said reflector secured by said member securing means. - View Dependent Claims (23, 45, 46, 47, 48, 49, 50, 51)
-
-
24. A reflector having unevenness formed on at least a portion of its reflecting surface,
wherein either depressions or protrusions are formed with a dot pattern with a dot diameter at each of a multiplicity of displaced coordinates that are derived by randomly displacing, within a movable range, at least a portion of a multiplicity of base coordinates that are regularly arranged according to a basic pitch.
-
25. A reflector having unevenness formed on at least a portion of its reflecting surface,
wherein either depressions or protrusions are formed with a line pattern with a line width at each side of a plurality of polygons that take as vertices at least a portion of a multiplicity of displaced coordinates that are derived by randomly displacing, within a movable range, at least a portion of a multiplicity of base coordinates that have been regularly arranged according to a basic pitch.
- 26. A reflector having unevenness formed on at least a portion of its reflecting surface, and having either depressions or protrusions formed with a line pattern of a predetermined line width at each side of a plurality of hexagons that are regularly arranged.
-
30. A liquid crystal fabrication device for fabricating a reflective liquid crystal display device in which a transparent substrate is arranged on the surface of a reflective substrate through a liquid crystal layer;
wherein a reflector is used as said reflective substrate. - View Dependent Claims (32, 33)
-
31. A liquid crystal display device, comprising:
-
a reflective substrate made up of a reflector, said reflector having unevenness formed on at least a portion of its reflecting surface, and having either depressions or protrusions formed with a pattern at each side of a plurality of polygons that are regularly arranged;
a transparent substrate that is arranged on the surface of said reflective substrate at a predetermined spacing; and
a liquid crystal layer that fills the space between said transparent substrate and said reflective substrate. - View Dependent Claims (52, 53, 54)
-
-
34. A portable terminal device, comprising:
-
a data entry device for externally entering various data;
a data processing device for executing data processes corresponding to various data that have been entered by said data entry device; and
a liquid crystal display device for displaying various data according to data processing of the data processing device, wherein said liquid crystal display device includes;
a reflective substrate made up of a reflector, said reflector having unevenness formed on at least a portion of its reflecting surface, and having either depressions or protrusions formed with a pattern at each side of a plurality of shapes that are regularly arranged;
a transparent substrate that is arranged on the surface of said reflective substrate at a predetermined spacing; and
a liquid crystal layer that fills the space between said transparent substrate and said reflective substrate.
-
Specification