Generation of pattern data free from any overlapping or excessive separation of dot patterns adjacent to each other

• US 20040239844A1
• Filed: 02/23/2004
• Published: 12/02/2004
• Est. Priority Date: 09/07/2001
• Status: Active Grant

• Current Assignee: NLT Technologies, Ltd. (Tianma Microelectronics Company Limited)
• Original Assignee: NEC LCD Technologies Limited (Tianma Microelectronics Company Limited)
• Inventors: Suzuki, Terusaki, Kanoh, Hiroshi
• Granted Patent: US 7,612,847 B2
• Time in Patent Office: Days
• US Class Current: 349/113
• CPC Class Codes: G02B 5/10 with curved faces
• CPC Class Codes: G02F 1/133553 Reflecting elements associated to illuminating devices G02F1/133605
• CPC Class Codes: G03F 1/00 Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Abstract

A device is disclosed for generating pattern data for unevenness that is randomly arranged on the surface of the reflective substrate of a reflective liquid crystal display device. The number of coordinates, a basic pitch, a movable range, and a dot diameter are entered from a data entry unit. An array generation unit regularly arranges base coordinates in two dimensions in accordance with the basic pitch. Coordinate displacement unit randomly displaces within the movable range at a portion of the basic coordinates to generate a multiplicity of displaced coordinates. Pattern generation unit arranges dot patterns with the dot diameter entered at each of the displaced coordinates generated to generate pattern data.

Claims

1. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

2. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging predetermined dot patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

3. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging predetermined line patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

11. A device according to claim 3, further comprising random number generation means for generating random numbers;

wherein said coordinate displacement means displaces said base coordinates according to random numbers generated by said random number generation means.

13. A device according to claim 3, wherein said coordinate displacement means includes means for displacing said base coordinates such that half width H of a distribution graph of the displacements of said displaced coordinates satisfies the relationship with said basic pitch P:

0.3 P≦

H≦

0.9 P.

4. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:

data entry means for entering a basic pitch, a movable range, and a dot diameter;

array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;

coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and

pattern generation means for arranging a dot pattern with said dot diameter at each of the multiplicity of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

7. A device according to claim 4, further comprising entry confirmation means for determining whether or not said basic pitch P, said movable range R, and said dot diameter D entered by said data enry means satisfy the relationship:

P≧

2R+D.

9. A device according to claim 4, wherein said array generation means includes means for arranging said base coordinates in positions such that even numbered rows of the base coordinates are displaced by one half of said basic pitch in the column direction relative to odd numbered rows of the base coordinates.

14. A device according to claim 4, wherein said coordinate displacement means includes means for displacing said base coordinates such that half width H of a distribution graph of the displacements of said displaced coordinates satisfies the relationship with said basic pitch P:

0.3P≦

H≦

0.9P.

5. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:

data entry means for entering a basic pitch, a movable range, and a line width;

array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;

coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and

pattern generation means for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

6. A device according to claim 5, wherein said polygons are hexagons.

8. A device according to claim 5, further comprising entry confirmation means for determining whether or not said basic pitch P, said movable range R, and said line width W entered by said data entry means satisfy the relationship:

P≧

2R+W.

10. A device according to claim 5, wherein said array generation means includes means for arranging said base coordinates in positions such that even numbered rows of the base coordinates are displaced by one half of said basic pitch in the column direction relative to odd numbered rows of the base coordinates.

12. A device according to claim 5, further comprising random number generation means for generating random numbers;

wherein said coordinate displacement means displaces said base coordinates according to random numbers generated by said random number generation means.

15. A computer program for causing a computer to execute processes for generating pattern data, said computer program comprising:

a first command set for entering a basic pitch, a movable range, and a dot diameter;

a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;

a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and

a fourth command set for arranging dot patterns with said dot diameter at least a portion of the multiplicity of said displaced coordinates generated by said third command set.

16. A computer program for causing a computer to execute processes for generating pattern data;

said computer program comprising;

a first command set for entering a pitch, a movable range, and a line width; and

a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;

a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and

a fourth command set for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said third command set to generate a pattern data.

17. A photomask fabrication device for fabricating, in accordance with pattern data, a photomask for use in photoetching, said device comprising:

a pattern generator, that generates pattern data;

pattern entry means for entering the pattern data generated by said pattern generator;

mask material securing means for securing mask material in a predetermined position; and

pattern forming means for forming either light transmitting portions or light blocking portions according to said pattern data on said mask material secured by said mask material securing means.

35. The device of claim 17, wherein said pattern generator includes:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

36. The device of claim 17, wherein said pattern generator includes:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging predetermined dot patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

37. The device of claim 17, wherein said pattern generator includes:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging predetermined line patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

38. The device of claim 17, wherein said pattern generator includes:

data entry means for entering a basic pitch, a movable range, and a dot diameter;

array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;

coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and

pattern generation means for arranging a dot pattern with said dot diameter at each of the multiplicity of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

39. The device of claim 17, wherein said pattern generator includes:

data entry means for entering a basic pitch, a movable range, and a line width;

array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;

coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and

pattern generation means for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

40. The device of claim 17, where said pattern generator is a computer program, said computer program including:

a first command set for entering a basic pitch, a movable range, and a dot diameter;

a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;

a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and

a fourth command set for arranging dot patterns with said dot diameter at least a portion of the multiplicity of said displaced coordinates generated by said third command set.

41. The device of claim 17, wherein said pattern generator is a computer program, said computer program including:

a first command set for entering a pitch, a movable range, and a line width; and

a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;

a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and

a fourth command set for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said third command set to generate a pattern data.

18. A photomask for use in photoetching;

wherein either a light transmitting portion or a light blocking portion is formed with a dot pattern with a dot diameter at each of a multiplicity of displaced coordinates that are derived by randomly displacing within a movable range at least a portion of a multiplicity of base coordinates regularly arranged in accordance with a basic pitch.

19. A photomask for use in photoetching;

wherein either a light transmitting portion or a light blocking portion is formed with a line pattern with a line width on each side of a plurality of polygons that take as vertices at least a portion of a multiplicity of displaced coordinates that are derived by randomly displacing within a movable range at least a portion of a multiplicity of base coordinates regularly arranged in accordance with a basic pitch.

20. A photomask for use in photoetching, wherein either a light transmitting portion or a light blocking portion is formed with a line pattern with a predetermined line width at each side of a multiplicity of hexagons that have been regularly arranged.

21. A reflector fabrication device for forming unevenness on the reflecting surface of a reflector by photoetching, said device comprising:

a photomask;

member securing means for securing a base member in a predetermined position;

member etching means for photoetching with said photomask at least a portion of the surface of said base member secured by said member securing means to form unevenness; and

metal film forming means for forming a metal thin film on the surface of said base member on which said unevenness formed by said member etching means to fabricate said reflector.

42. The device of claim 21, wherein said photomask includes either a light transmitting portion or a light blocking portion formed with a dot pattern with a dot diameter at each of a multiplicity of displaced coordinates that are derived by randomly displacing within a movable range at least a portion of a multiplicity of base coordinates regularly arranged in accordance with a basic pitch.

43. The device of claim 21, wherein said photomask includes either a light transmitting portion or a light blocking portion formed with a line pattern with a line width on each side of a plurality of polygons that take as vertices at least a portion of a multiplicity of displaced coordinates that are derived by randomly displacing within a movable range at least a portion of a multiplicity of base coordinates regularly arranged in accordance with a basic pitch.

44. The device of claim 21, wherein said photomask includes either a light transmitting portion or a light blocking portion formed with a line pattern with a predetermined line width at each side of a multiplicity of hexagons that have been regularly arranged.

22. A reflector fabrication device for forming unevenness on the reflecting surface of a reflector in accordance with pattern data, said device comprising:

a pattern generator, that generates pattern data;

pattern entry means for entering pattern data generated either by said pattern generator or by said computer program;

member securing means for securing said reflector in a predetermined position; and

pattern forming means for forming either depressions or protrusions in accordance with said pattern data on the surface of said reflector secured by said member securing means.

23. A reflector fabrication device according to claim 22, wherein said reflector is a base member having a metal thin film formed on at least a portion of its surface.

45. The device of claim 22, wherein said pattern generator includes:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

46. The device of claim 22, wherein said pattern generator includes:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging predetermined dot patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

47. The device of claim 22, wherein said pattern generator includes:

coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

pattern generation means for arranging predetermined line patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

48. The device of claim 22, wherein said pattern generator includes:

data entry means for entering a basic pitch, a movable range, and a dot diameter;

array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;

coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and

pattern generation means for arranging a dot pattern with said dot diameter at each of the multiplicity of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

49. The device of claim 22, wherein said pattern generator includes:

data entry means for entering a basic pitch, a movable range, and a line width;

array generation means for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said data entry means;

coordinate displacement means for randomly displacing within said movable range at least a portion of said base coordinates arranged by said array generation means to generate a multiplicity of displaced coordinates; and

pattern generation means for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said coordinate displacement means to generate pattern data.

50. The device of claim 22, where said pattern generator is a computer program, said computer program including:

a first command set for entering a basic pitch, a movable range, and a dot diameter;

a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;

a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and

a fourth command set for arranging dot patterns with said dot diameter at least a portion of the multiplicity of said displaced coordinates generated by said third command set.

51. The device of claim 22, wherein said pattern generator is a computer program, said computer program including:

a first command set for entering a pitch, a movable range, and a line width; and

a second command set for regularly arranging a multiplicity of base coordinates in two dimensions in accordance with said basic pitch entered by said first command set;

a third command set for randomly displacing within said movable range at least a portion of said base coordinates arranged by said second command set; and

a fourth command set for arranging a line pattern with said line width at each side of a plurality of predetermined polygons that take as vertices at least a portion of said displaced coordinates generated by said third command set to generate a pattern data.

24. A reflector having unevenness formed on at least a portion of its reflecting surface,

wherein either depressions or protrusions are formed with a dot pattern with a dot diameter at each of a multiplicity of displaced coordinates that are derived by randomly displacing, within a movable range, at least a portion of a multiplicity of base coordinates that are regularly arranged according to a basic pitch.

27. The reflector according to any one of claims claim 24, wherein said unevenness is formed on the surface of said metal thin film.

28. The reflector according to any one of claims claim 24, wherein the mean pitch Pa of said depressions or said protrusions satisfies the relationship:

1.0 pm≦

Pa≦

80 pm.

29. The reflector according to any one of claims claim 24, wherein the half width H of a pitch distribution graph of said depressions or said protrusions satisfies the relationship:

0.3 Pa≦

H≦

0.9 Pa.

25. A reflector having unevenness formed on at least a portion of its reflecting surface,

wherein either depressions or protrusions are formed with a line pattern with a line width at each side of a plurality of polygons that take as vertices at least a portion of a multiplicity of displaced coordinates that are derived by randomly displacing, within a movable range, at least a portion of a multiplicity of base coordinates that have been regularly arranged according to a basic pitch.

55. The reflector of claim 25, wherein said unevenness is formed on the surface of said metal thin film.

56. The reflector of claim 25, wherein the mean pitch Pa of said depressions or said protrusions satisfies the relationship:

1.0 pm≦

Pa≦

80 pm.

57. The reflector of claim 25, wherein the half width H of a pitch distribution graph of said depressions or said protrusions satisfies the relationship:

0.3 Pa≦

H≦

0.9 Pa.

26. A reflector having unevenness formed on at least a portion of its reflecting surface, and having either depressions or protrusions formed with a line pattern of a predetermined line width at each side of a plurality of hexagons that are regularly arranged.

58. The reflector of claim 26, wherein said unevenness is formed on the surface of said metal thin film.

59. The reflector of claim 26, wherein the mean pitch Pa of said depressions or said protrusions satisfies the relationship:

1.0 pm≦

Pa≦

80 pm.

60. The reflector of claim 26, wherein the half width H of a pitch distribution graph of said depressions or said protrusions satisfies the relationship:

0.3 Pa≦

H≦

0.9 Pa.

30. A liquid crystal fabrication device for fabricating a reflective liquid crystal display device in which a transparent substrate is arranged on the surface of a reflective substrate through a liquid crystal layer;

wherein a reflector is used as said reflective substrate.

32. A device according to claim 30, wherein a reflecting surface of said reflective substrate on which said unevenness is formed is arranged at each liquid crystal picture element.

33. A device according to claim 32, wherein said unevenness is formed on portions of said reflecting surface of each of said liquid crystal picture elements.

31. A liquid crystal display device, comprising:

a reflective substrate made up of a reflector, said reflector having unevenness formed on at least a portion of its reflecting surface, and having either depressions or protrusions formed with a pattern at each side of a plurality of polygons that are regularly arranged;

a transparent substrate that is arranged on the surface of said reflective substrate at a predetermined spacing; and

a liquid crystal layer that fills the space between said transparent substrate and said reflective substrate.

52. The device of claim 31, wherein either said depressions or said protrusion are formed with a dot pattern with a dot diameter at each of a multiplicity of displaced coordinates that are derived by randomly displacing, within a movable range, at least a portion of a multiplicity of base coordinates that are regularly arranged according to a basic pitch.

53. The device of claim 31, wherein either said depressions or said protrusions are formed with a line pattern with a line width at each side of a plurality of polygons that take as vertices at least a portion of a multiplicity of displaced coordinates that are derived by randomly displacing, within a movable range, at least a portion of a multiplicity of base coordinates that have been regularly arranged according to a basic pitch.

54. The device of claim 31, wherein either said depressions or said protrusion are formed with a line pattern of a predetermined line width at each side of a plurality of hexagons that are regularly arranged.

34. A portable terminal device, comprising:

a data entry device for externally entering various data;

a data processing device for executing data processes corresponding to various data that have been entered by said data entry device; and

a liquid crystal display device for displaying various data according to data processing of the data processing device, wherein said liquid crystal display device includes;

a reflective substrate made up of a reflector, said reflector having unevenness formed on at least a portion of its reflecting surface, and having either depressions or protrusions formed with a pattern at each side of a plurality of shapes that are regularly arranged;

a transparent substrate that is arranged on the surface of said reflective substrate at a predetermined spacing; and

a liquid crystal layer that fills the space between said transparent substrate and said reflective substrate.