Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
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Abstract
A transparent substrate particularly of glass, provided with a stack of thin layers having at least one metallic layer (4) having properties in the infrared range particularly having low emissivity and two coatings having a base of dielectric material located one (8) under and the other (9) over the layer having properties in the infrared range, as well as a protective metallic layer (5) place immediately over an in contact with the layer having properties in the infrared range, characterized in that in order to prevent the modification of properties of the stack, particularly optical and thermal properties, in the case where the substrate is submitted to a thermal treatment of the tempering or bending kind, firstly the second coating (9) having a base of dielectric material, includes a barrier layer for the diffusion of oxygen chosen from the following materials: components of silicon SiO2, SiOxCy, SiONNy, nitrates such as Si3N4 or AlN, carbides such as SiC, TiC, CrC, TaC of a thickness of at least 10 nanometers and preferably of at least 20 nanometers, and secondly the layer having properties in the infrared range is directly in contact with the underlying dielectric coating.
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Citations
55 Claims
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1-23. -23 (Cancelled):
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24. A transparent substrate, comprising a stack of thin layers having at elast one layer with properties in the infra-red range, which comprises on a carrier substrate in order:
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a) a first undercoating comprising a dielectric material;
b) a layer having properties in the infra-red range;
c) a primer metallic coating, and d) a second overcoating, comprising dielectric material;
wherein in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first undercoating comprising dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising dielectric material has at least a second barrier layer for the diffusion of oxygen; and
further wherein iii) a first oxide layer is intercalated between the first undercoating and said layer having properties in the infrared range, and a second oxide layer is also intercalated between said primer metallic coating and the second overcoating, said first and second oxide layers being the same or different;
the first undercoating and second overcoating each, independently, being selected from the group consisting of silicon nitride and silicon oxynitride. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. A transparent substrate, comprising a stack of thin layers on a carrier substrate, the stack of thin layers comprising:
- Si3N4/ZnO/Ag/NiCr/ZnO/Si3N4
whereby properties of the stack are retained without modification when the carrier substrate is submitted to a thermal treatment of bending or tempering. - View Dependent Claims (36)
- Si3N4/ZnO/Ag/NiCr/ZnO/Si3N4
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37. A transparent substrate, comprising a stack of thin layers on a carrier substrate, the stack of thin layers comprising:
- Si3N4/ZnO/Ag/NiCr/SnO2/Si3N4.
- View Dependent Claims (38)
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39. A transparent substrate, comprising a stack of thin layers on carrier substrate, wherein the stack of thin layers comprises:
Si3N4·
Al/ZnO/Ag/NiCr/SnO2/Si3N4·
Al.- View Dependent Claims (40)
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41. A transparent substrate, comprising a stack of thin layers on a carrier substrate, wherein the stack of thin layers comprises a plurality of layers with properties in the infra-red range, and comprises in order:
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a) a first undercoating comprising a dielectric material;
b) a layer having properties in the infra-red range;
c) a primer metallic coating; and
d) a second overcoating, comprising a dielectric material;
wherein in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first undercoating comprising a dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising a dielectric material has at least a second barrier layer for the diffusion of oxygen;
iii) a first oxide layer is intercalated between the first undercoating and said layer having properties in the infra-red range, and a second oxide layer is intercalated between said primer metallic coating and the second overcoating, said first and second oxide layers being the same or different;
the first undercoating and second overcoating each, independently, being selected from the group consisting of silicon nitride and silicon oxynitride; and
wherein a), b), c), d), i), ii) and iii) each, independently and optionally, repeat at least one additional time to provide said plurality of layers in the stack having properties in the infra-red range. - View Dependent Claims (42, 43, 44, 45, 46, 47, 48, 49, 50, 51)
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52. A transparent substrate, comprising a stack of thin layers on a carrier substrate, the stack of thin layers comprising:
Si3N4/ZnO/Ag/NiCr/SnO2/Si3N4/ZnO/Ag/NiCr/SnO2/Si3N4. - View Dependent Claims (53)
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54. A transparent substrate, comprising a stack of thin layers on a carrier substrate, wherein the stack of thin layers comprises:
Si3N4·
Al/ZnO/Ag/NiCr/SnO2/Si3N4·
Al/ZnO/Ag/NiCr/SnO2/Si3N4·
Al.- View Dependent Claims (55)
Specification