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MEMS device and method of forming MEMS device

  • US 20040245588A1
  • Filed: 06/03/2003
  • Published: 12/09/2004
  • Est. Priority Date: 06/03/2003
  • Status: Active Grant
First Claim
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1. A method of forming a MEMS device, the method comprising:

  • providing a substructure including a base material and at least one conductive layer formed on a first side of the base material;

    forming a dielectric layer over the at least one conductive layer of the substructure;

    forming a protective layer over the dielectric layer;

    defining an electrical contact area for the MEMS device on the protective layer; and

    forming an opening within the electrical contact area through the protective layer and the dielectric layer to the at least one conductive layer of the substructure.

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