Lithographic linear motor, lithographic apparatus, and device manufacturing method
First Claim
Patent Images
1. A lithographic apparatus, comprising:
- a radiation system configured to supplying a beam of radiation;
a support structure for supporting a patterning device that imparts a desired pattern to said beam of radiation;
a substrate holder configured to hold a substrate;
a projection system configured to project said patterned beam of radiation onto a target portion of said substrate; and
a linear motor configured to move one of said support structure and said substrate table, said linear motor comprising;
a first magnetic plate;
a second magnetic plate arranged opposite to said first magnetic plate; and
an open coil unit, interposed between said first and second magnetic plates, including a plurality of coils wound about respective ferromagnetic cores, wherein said first and second magnetic plates and said coil unit are relatively moveable.
1 Assignment
0 Petitions
Accused Products
Abstract
A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.
-
Citations
19 Claims
-
1. A lithographic apparatus, comprising:
-
a radiation system configured to supplying a beam of radiation;
a support structure for supporting a patterning device that imparts a desired pattern to said beam of radiation;
a substrate holder configured to hold a substrate;
a projection system configured to project said patterned beam of radiation onto a target portion of said substrate; and
a linear motor configured to move one of said support structure and said substrate table, said linear motor comprising;
a first magnetic plate;
a second magnetic plate arranged opposite to said first magnetic plate; and
an open coil unit, interposed between said first and second magnetic plates, including a plurality of coils wound about respective ferromagnetic cores, wherein said first and second magnetic plates and said coil unit are relatively moveable. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. A device manufacturing method, comprising:
-
providing a substrate;
providing a beam of radiation using a radiation system;
imparting a desired pattern onto said beam of radiation by employing a patterning device;
projecting said patterned beam of radiation onto a target portion of said substrate; and
displacing at least one of said substrate and said patterning device by using a linear motor, said linear motor comprising first and second magnetic plates that are arranged opposite to each other, and an open coil unit between said first and second magnetic plates, said coil unit comprising a plurality of coils wound about respective ferromagnetic cores, wherein said magnetic plates and said coil unit are relatively moveable.
-
-
11. A linear motor, comprising:
-
a first magnetic plate;
a second magnetic plate arranged opposite to said first magnetic plate; and
an open coil unit, interposed between said first and second magnetic plates, including a plurality of coils wound about respective ferromagnetic cores, wherein said first and second magnetic plates and said coil unit are relatively moveable. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
-
Specification