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Lithographic linear motor, lithographic apparatus, and device manufacturing method

  • US 20040246458A1
  • Filed: 03/11/2004
  • Published: 12/09/2004
  • Est. Priority Date: 03/11/2003
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a radiation system configured to supplying a beam of radiation;

    a support structure for supporting a patterning device that imparts a desired pattern to said beam of radiation;

    a substrate holder configured to hold a substrate;

    a projection system configured to project said patterned beam of radiation onto a target portion of said substrate; and

    a linear motor configured to move one of said support structure and said substrate table, said linear motor comprising;

    a first magnetic plate;

    a second magnetic plate arranged opposite to said first magnetic plate; and

    an open coil unit, interposed between said first and second magnetic plates, including a plurality of coils wound about respective ferromagnetic cores, wherein said first and second magnetic plates and said coil unit are relatively moveable.

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