Integrated circuit, semiconductor device comprising the same, electronic device having the same, and driving method of the same
First Claim
1. An integrated circuit comprising a DRAM, wherein the DRAM comprises a plurality of memory cells, each of said plurality of memory cells comprising a thin film transistor;
- and wherein the thin film transistor comprises an active layer, and first and second electrodes overlapping with each other with the active layer interposed therebetween.
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Accused Products
Abstract
An integrated circuit mounting a DRAM which can realize high integration without complicated manufacturing steps. The integrated circuit according to the invention comprises a DRAM in which a plurality of memory cells each having a thin film transistor are disposed. The thin film transistor comprises an active layer including a channel forming region, and first and second electrodes overlapping with each other with the channel forming region interposed therebetween. By controlling a drain voltage of the thin film transistor according to data, it is determined whether to accumulate holes in the channel forming region or not, and data is read out by confirming whether or not holes are accumulated,.
63 Citations
21 Claims
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1. An integrated circuit comprising a DRAM,
wherein the DRAM comprises a plurality of memory cells, each of said plurality of memory cells comprising a thin film transistor; - and
wherein the thin film transistor comprises an active layer, and first and second electrodes overlapping with each other with the active layer interposed therebetween. - View Dependent Claims (2, 3, 4, 5, 17)
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6. An integrated circuit comprising a DRAM,
wherein the DRAM comprises a plurality of memory cells, each of said plurality of memory cells comprising a memory element; -
wherein a thin film transistor comprises a first electrode, a second electrode, an active layer which includes a channel forming region, a first insulating layer, and a second insulating layer is used as the memory element;
wherein the first electrode overlaps with the active layer with the first insulating layer interposed therebetween;
wherein the second electrode overlaps with the active layer with the second insulating layer interposed therebetween; and
wherein the first and second electrodes overlap with each other with the channel forming region interposed inbetweem. - View Dependent Claims (18)
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7. An integrated circuit comprising a DRAM,
wherein the DRAM comprises a plurality of memory cells, each of said plurality of memory cells comprising a first thin film transistor and a second thin film transistor; -
wherein the first thin film transistor comprises a first electrode, a second electrode, an active layer, a first insulating layer, and a second insulating layer;
wherein the active layer comprises a channel forming region, and source and drain regions interposing the channel forming region therebetween;
wherein the first electrode overlaps with the active layer with the first insulating layer interposed therebetween;
wherein the second electrode overlaps with the active layer with the second insulating layer interposed therebetween;
wherein the first and second electrodes overlap with each other with the channel forming region interposed therebetween; and
wherein potential supply to the drain region is controlled by the second thin film transistor. - View Dependent Claims (8, 19)
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9. An integrated circuit comprising,
a DRAM which comprises a plurality of memory cells, each of said plurality of memory cells comprising a thin film transistor comprising a first electrode, a second electrode, and an active layer including a channel forming region; -
first means for controlling a drain voltage of the thin film transistor;
second means for controlling a potential of the first electrode; and
third means for confirming the amount of holes which are accumulated in the channel forming region, wherein the first and second electrodes overlap with each other with the active layer interposed therebetween;
wherein data is written by controlling a cumulative amount of the holes using the first and second means; and
wherein the data is read out by confirming the cumulative amount of the holes using the third means. - View Dependent Claims (10, 11, 20)
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12. A semiconductor device comprising:
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an integrated circuit which comprises a DRAM; and
a pixel portion which is controlled by the integrated circuit, wherein the DRAM comprises a plurality of memory cells, each of said plurality of memory cells comprising a memory element;
wherein a second thin film transistor comprising a first electrode, a second electrode, an active layer including a channel forming region, a first insulating layer, and a second insulating layer is used as the memory element;
wherein the first electrode overlaps with the active layer with the first insulating layer interposed therebetween;
wherein the second electrode overlaps with the active layer with the second insulating layer interposed therebetween; and
wherein the first and second electrodes overlap with each other with the channel forming region interposed therebetween. - View Dependent Claims (21)
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13. A driving method of an integrated circuit,
wherein the integrated circuit comprises a DRAM which comprises a plurality of memory cells, each of said plurality of memory cells comprising a thin film transistor; -
wherein the thin film transistor comprises an active layer including a channel forming region, and first and second gate electrodes overlapping with each other with the active layer interposed therebetween;
wherein data is written by controlling a potential of the second electrode to turn ON the thin film transistor, and controlling a drain voltage of the thin film transistor to accumulate holes in the channel forming region, thereby controlling the cumulative amount of the holes by using a potential of the first electrode; and
wherein the data is read out by using a drain current or a threshold voltage of the thin film transistor. - View Dependent Claims (15)
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14. A driving method of an integrated circuit,
wherein the integrated circuit comprises a DRAM which comprises a plurality of memory cells, each of said plurality of memory cells comprising a thin film transistor; -
wherein the thin film transistor comprises an active layer including a channel forming region, and first and second gate electrodes overlapping with each other with the active layer interposed therebetween;
wherein data having three states or more is written by controlling a potential of the second electrode to turn ON the thin film transistor, and controlling a drain voltage of the thin film transistor to accumulate holes in the channel forming region, thereby controlling the cumulative amount of the holes by using a potential of the first electrode; and
wherein the data is read out by using a drain current or a threshold voltage of the thin film transistor. - View Dependent Claims (16)
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Specification