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Anti-fog coating composition, process, and article

  • US 20040247892A1
  • Filed: 07/08/2004
  • Published: 12/09/2004
  • Est. Priority Date: 01/31/2002
  • Status: Abandoned Application
First Claim
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1. A process for forming an anti-fog film on a substrate comprising applying an aqueous coating composition to the substrate, wherein the aqueous coating composition comprises a silicone compound free from a sulfonic acid group, a water dispersible polyurethane compound, and water;

  • and coalescing the silicone compound and polyurethane compound to form a film on the substrate wherein the silicone compound is organosiloxane of the formula;

    Ma M′

    bDcD′

    dTeT′

    fQg,wherein the subscripts a, c, d, e, f, and g are zero or a positive integer, subject to the limitation that the sum of the subscripts b, d, and f is one or greater;

    M has the formula;

    R13 SiO1/2, wherein each R1 is independently a monovalent hydrocarbon radical having from one to forty carbon atoms;

    M′

    has the formula;

    R23-h R3h SiO1/2, wherein each R2 and R3 are independently monovalent hydrocarbon radicals having from one to forty carbon atoms, and the subscript h is 1, 2, or 3;

    D has the formula;

    R42 SiO2/2, wherein each R4 is independently a monovalent hydrocarbon radical having from one to forty carbon atoms;

    D′

    has the formula;

    R52-iR6iSiO2/2, wherein each of R5 and R6 is independently a monovalent hydrocarbon radical having from one to forty carbon atoms, and the subscript i is 1 or 2;

    T has the formula;

    R7SiO3/2, wherein each R7 is a monovalent hydrocarbon radical having from one to forty carbon atoms;

    T′

    has the formula;

    R8SiO3/2, wherein R8 is a monovalent hydrocarbon radical having from one to forty carbon atoms; and

    Q has the formula;

    SiO4/2;

    or an ionic or nonionic siloxane alkoxylate of the formula;

    wherein each of R9-17 are independently a monovalent hydrocarbon radical, R18 is of the general formula;

    R19-Z-(CmH(2m-1)R20O)j(CnH2nO)kR21, m and n are integers greater than or equal to 0;

    j and k are integers greater than or equal to 0, subject to the proviso that the sum of j+k is greater than or equal to 1;

    Z is —

    O—

    , —

    S—

    , —

    CO—

    , —

    NH—

    , or —

    NH2

    ;

    R19 is a divalent hyrdocarbylene radical, R20 and R21 are independently hydrogen, alkyl, hydroxyalkyl, amino, amido, amineoxide, cyano, isocyano, aryl, arylene, carboxy, alkoxy, halogen, haloalkyl, haloalkoxy, sulfo, sulfamo, phosphono, salts thereof, combinations comprising at least one of the foregoing, and the like; and

    wherein x and y are integers greater than or equal to 0, subject to the proviso that x+y is greater than or equal to 1.

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