Nanoelectronic interconnection and addressing
First Claim
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1. A method for manufacturing a wafer having conductors separated by distances in the range of from about 1 to about 100 nm for nanoscale electronics, comprising the steps of depositing sequential layers of conductors, semiconductors and/or dielectrics on a sheath substrate at thicknesses in the range of from about 1 to about 100 nm to form a layered wafer boule patterning at least some of the conductor or semiconductor layers for backside addressing;
- cross cutting the wafer boule, and polishing the front and back surfaces to provide a nanoscale wafer.
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Abstract
Methods and devices relating to nanoscale electronics, including fabrication and addressing of molecular electronics.
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4 Claims
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1. A method for manufacturing a wafer having conductors separated by distances in the range of from about 1 to about 100 nm for nanoscale electronics, comprising the steps of
depositing sequential layers of conductors, semiconductors and/or dielectrics on a sheath substrate at thicknesses in the range of from about 1 to about 100 nm to form a layered wafer boule patterning at least some of the conductor or semiconductor layers for backside addressing; cross cutting the wafer boule, and polishing the front and back surfaces to provide a nanoscale wafer. - View Dependent Claims (2, 3, 4)
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