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Cvd apparatus and method of cleaning the cvd apparatus

  • US 20040250775A1
  • Filed: 04/27/2004
  • Published: 12/16/2004
  • Est. Priority Date: 03/27/2002
  • Status: Active Grant
First Claim
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1. A CVD apparatus for supplying a reactive gas into a reaction chamber and forming a deposited film on a surface of a base material provided in the reaction chamber, wherein an exhaust gas recycling path for recycling an exhaust gas reaching the reaction chamber is provided on an exhaust path for exhausting a gas from an inner part of the reaction chamber through a pump.

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