Production of carbon nanotubes
First Claim
Patent Images
1. A method of forming a carbon nanotubes by plasma enhanced chemical vapour deposition using a carbon containing gas plasma, wherein the carbon nonotubes are either formed on a substrate placed within a chamber wherein the substrate temperature is less than 300°
- C., or are formed within the chamber and subsequently deposited on a substrate external to the chamber.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of forming carbon nanotubes by plasma enhanced chemical vapour deposition using a carbon containing gas plasma, wherein the carbon nanotubes are not formed on a substrate at a temperature 300° C. or above.
199 Citations
64 Claims
-
1. A method of forming a carbon nanotubes by plasma enhanced chemical vapour deposition using a carbon containing gas plasma, wherein the carbon nonotubes are either formed on a substrate placed within a chamber wherein the substrate temperature is less than 300°
- C., or are formed within the chamber and subsequently deposited on a substrate external to the chamber.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58)
-
59. A method of providing a pattern of carbon nanotubes on a fabric or organic material.
- 60. A method of forming ropes of partially aligned carbon nanotubes, comprising placing said nanotubes in a liquid selected so that the nanotubes self-orgnaise into bundles.
Specification