Sputter target
First Claim
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1. A sputter target comprising a target holder having an outer surface and a target material formed on said outer surface, said target material comprising a metal, a metal alloy or a metal oxide;
- said target material having a relative density higher than 92% of the theoretical density of the metal or metal alloy.
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Accused Products
Abstract
The invention relates to a sputter target and more particularly to a zinc sputter target. The target comprises a target holder having an outer surface and a target material formed on said outer surface. The target material has a relative density higher than 92% of the theoretical density of the metal or metal alloy. Furthermore the invention relates to a process for the manufacturing of a sputter target.
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Citations
23 Claims
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1. A sputter target comprising a target holder having an outer surface and a target material formed on said outer surface, said target material comprising a metal, a metal alloy or a metal oxide;
- said target material having a relative density higher than 92% of the theoretical density of the metal or metal alloy.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
Specification