Whole-substrate spectral imaging system for CMP
First Claim
Patent Images
1. A substrate imaging system, comprising:
- a carrier holding a substrate;
a platen holding a polishing pad;
a frame for disposing the platen relative to the carrier; and
an reflectance image processing subsystem for acquiring one or more two-dimensional images of the substrate during CMP of the substrate and deriving therefrom information about the substrate useful for subsequent CMP of the substrate.
1 Assignment
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Accused Products
Abstract
Systems of and methods for capturing a plurality of one-dimensional images representative of substantially all of the surface of a substrate within a single revolution of a rotating platen holding a polishing pad in operative contact with the surface of the substrate during chemical-mechanical planarization. A two-dimensional image comprising frame data, which may comprise a spectral image, is derived from the plurality of one-dimensional images. The frame data provides information useful for subsequent chemical-mechanical processing of the substrate.
42 Citations
51 Claims
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1. A substrate imaging system, comprising:
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a carrier holding a substrate;
a platen holding a polishing pad;
a frame for disposing the platen relative to the carrier; and
an reflectance image processing subsystem for acquiring one or more two-dimensional images of the substrate during CMP of the substrate and deriving therefrom information about the substrate useful for subsequent CMP of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A substrate imaging system comprising:
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a carrier holding a substrate, the substrate having a pad-contacting surface;
a platen holding a polishing pad;
a frame for operatively disposing the platen relative to the carrier; and
an image processing subsystem for capturing, from light reflected from the pad-contacting surface and transmitted through one or more optically transparent elements in the platen and/or polishing pad, a plurality of one-dimensional images representative of at least a portion of the pad-contacting surface of the substrate during traversal of the opening and/or optically transparent elements, and deriving therefrom a frame comprising frame data providing information about the substrate useful for subsequent chemical-mechanical processing of the substrate. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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17. A whole-substrate imaging system comprising:
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a carrier holding a substrate, the substrate having a pad-contacting surface with a maximum planar dimension;
a platen having a radius and holding a polishing pad, the platen including a slit having a length equal to or exceeding the maximum planar dimension of the substrate, the length disposed substantially along the platen radius, and the polishing pad having an optically transparent element located at about the slit;
a frame for operatively disposing the platen relative to the carrier, such that the pad-contacting surface of the substrate contacts the polishing pad, and substantially completely traverses the slit when the pad-contacting surface moves relative to the platen; and
an image processing subsystem for capturing, from light reflected from the pad-contacting surface and transmitted through the optically transparent element and the slit, a plurality of one-dimensional images representative of the substantial entirety of the pad-contacting surface of the substrate during traversal of the pad-contacting surface past the slit, and deriving therefrom a frame comprising frame data useful for subsequent chemical-mechanical processing of the substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23)
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24. A whole-die imaging system comprising:
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a carrier holding a substrate, the substrate having a pad-contacting surface forming a die and having a maximum planar dimension;
a rotating platen having a radius and holding a polishing pad, the platen including a slit having a length approximately equal to the maximum planar dimension of the die, the length disposed substantially along the platen radius, and the polishing pad having an optically transparent element located at about the slit;
a frame for operatively disposing the rotating platen relative to the carrier, such that the pad-contacting surface of the substrate contacts the polishing pad, and substantially completely traverses the slit within a rotation of the platen; and
an image processing subsystem for capturing, from light reflected from the pad-contacting surface and transmitted through the optically transparent element and the slit, a plurality of one-dimensional images representative of the substantial entirety of the pad-contacting surface of the die during traversal of the pad-contacting surface past the slit, and deriving therefrom a frame comprising frame data providing information about the die useful for subsequent chemical-mechanical processing of the substrate. - View Dependent Claims (25, 26, 27, 28, 29)
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30. A system for imaging a substrate during CMP, comprising:
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a carrier holding a substrate, the substrate having a pad-contacting surface;
a rotating platen holding a polishing pad;
a frame for operatively disposing the rotating platen relative to the carrier; and
an image processing subsystem for capturing, from light reflected from the pad-contacting surface and transmitted through one or more optically transparent elements in the platen and/or polishing pad, data points representative of at least a portion of the pad-contacting surface of the substrate during traversal of the opening and/or optically transparent elements, and deriving therefrom one or more one-dimensional reflectance images of a portion of a substrate, where data point spacing is determined by an array of data collection locations disposed substantially non-parallel to the direction of substrate motion. - View Dependent Claims (31, 32, 33, 34, 35, 36, 37, 38)
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39. A method for polishing a semiconductor substrate, comprising:
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acquiring one or more two-dimensional images of the substrate during CMP; and
deriving therefrom information about the substrate useful for subsequent chemical-mechanical processing of the substrate. - View Dependent Claims (40, 41, 42)
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43. A method of imaging a substrate comprising:
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holding a substrate having a pad-contacting surface;
holding a polishing pad with a platen including one or more optically transparent elements;
operatively disposing the rotating platen relative to the pad-contacting surface, such that the pad-contacting surface contacts the polishing pad, and substantially completely traverses the one or more optically transparent elements within a rotation of the platen;
capturing, from light reflected from the pad-contacting surface and transmitted through the one or more optically transparent elements, a plurality of one-dimensional images representative of at least a portion of the pad-contacting surface during traversal of the pad-contacting surface past the optically transparent elements; and
deriving therefrom a frame comprising frame data useful for subsequent chemical-mechanical processing of the substrate. - View Dependent Claims (44, 45, 46, 47)
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48. A method for aquiring a two-dimensional image of a substrate during CMP, comprising:
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holding a substrate, the substrate having a pad-contacting surface and a maximum planar dimension;
holding a polishing pad with a rotating platen, the platen having a radius and including a slit having a length disposed substantially along the radius of the platen and equal to or exceeding the maximum planar dimension of the substrate, the platen also including an optically transparent element located at about the slit;
operatively disposing the rotating platen relative to the pad-contacting surface, such that the pad-contacting surface of the substrate contacts the polishing pad, and substantially completely traverses the slit within a rotation of the platen;
capturing, from light reflected from the pad-contacting surface and transmitted through the optically transparent element, a plurality of one-dimensional images representative of the substantial entirety of the pad-contacting surface of the substrate during traversal of the pad-contacting surface past the slit; and
deriving therefrom a frame comprising frame data providing information about the substrate useful for subsequent chemical-mechanical processing of the substrate. - View Dependent Claims (49, 50, 51)
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Specification