Lithographic apparatus and device manufacturing method

• US 20040263000A1
• Filed: 04/29/2004
• Published: 12/30/2004
• Est. Priority Date: 05/01/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hol, Sven Antoin Johan, Van Der Schoot, Harmen Klaas, Cox, Henrikus Herman Marie, Vreugdewater, Patricia
• Granted Patent: US 7,245,047 B2
• Time in Patent Office: Days
• US Class Current: 310/12.07
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
• CPC Class Codes: H02K 2201/18 Machines moving with multiple degrees of freedom
• CPC Class Codes: H02K 41/03 Synchronous motors; Motors moving step by step; Reluctance motors H02K41/035 takes precedence

Abstract

A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.

Claims

1. A lithographic projection apparatus, comprising:

a radiation system configured to provide a beam of radiation;

a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate; and

an actuator configured to drive an object in six degrees of freedom, wherein the actuator comprises a five degrees of freedom small stroke Lorentz actuator and a one or two degree of freedom 2-phase or 3-phase motor.

2. A lithographic projection apparatus according to claim 1, wherein the actuator has a magnet matrix stator common to both the Lorentz actuator and the 2-phase or 3-phase motor.

3. A lithographic projection apparatus according to claim 2, wherein coils of the Lorentz actuator and the two-phase or three-phase motor are at 45°

to the axis of the magnet matrix stator.

4. A lithographic projection apparatus according to claim 3, wherein the coils and stator are arranged such that during movement in the one degree of freedom of the 2-phase or three-phase motor, the coils of the Lorentz actuator substantially remain over magnets of the stator of the same polarisation.

5. A lithographic projection apparatus according to claim 1, wherein the actuator has a planar coil assembly armature comprising coils for both the linear actuator and the 2-phase or 3-phase motor.

6. A lithographic projection apparatus according to claim 5, wherein the coil assembly comprises a central set of coils which are part of the 2-phase or 3-phase motor.

7. A lithographic projection apparatus according to claim 5 or 6, wherein the coil assembly comprises two sets of four coils, each set of four coils being for movement in one of two orthogonal directions and being part of the Lorentz actuator.

8. A lithographic projection apparatus according to claim 5, wherein the coil assembly comprises three sets of two coils, each set of two coils being for movement in one of two orthogonal directions and being part of the Lorentz actuator.

9. A lithographic projection apparatus according to claim 1, further comprising:

conduits configured to supply utilities to the object; and

a conduit shuttle for at least partly supporting the conduits, the conduit shuttle being positionable by the actuator.

10. A lithographic projection apparatus according to claim 9 further comprising a balance mass associated with the conduit shuttle, wherein the actuator is partly assembled on the balance mass and partly assembled on the conduit shuttle.

11. A lithographic projection apparatus according to claim 9 wherein the conduits supply utilities to a positioning device of at least one of the substrate table and the support structure.

12. A lithographic projection apparatus according to claim 1, wherein the actuator is configured to generate a reaction force between a balance mass and the support or the substrate table thereby to position the support or the substrate table.

13. A lithographic projection apparatus according to claim 11, wherein, in use, the center of gravity of the balance mass and the centre of gravity of the support are substantially in the same horizontal plane.

14. A lithographic projection apparatus according to claim 1, wherein the actuator further comprises a ferromagnetic member to ensure attraction between a stator and armature when the an actuator is de-activated.

15. A lithographic projection apparatus according to claim 1, wherein the actuator, in use, is orientated such that the gap between an armature and a stator is substantially planar and either vertical or horizontal.

16. A device manufacturing method, comprising:

providing a substrate that is at least partially covered by a layer of radiation-sensitive material;

projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material’ and

positioning an object using an actuator with six degrees of freedom,

wherein the positioning involves actuation of a 2-phase or 3-phase motor of the actuator and a five degrees of freedom Lorentz actuator of the actuator.