Color filter and fabrication method thereof

• US 20040263721A1
• Filed: 06/30/2003
• Published: 12/30/2004
• Est. Priority Date: 06/30/2003
• Status: Active Grant

• Current Assignee: InnoLux Corporation
• Original Assignee: Toppoly Optoelectronics Corporation (InnoLux Corporation)
• Inventors: Tai, Ya-Hsiang, Chen, Jun Chang
• Granted Patent: US 7,023,507 B2
• Time in Patent Office: Days
• US Class Current: 349/106
• CPC Class Codes: G02F 1/133512 Light shielding layers, e.g. black matrix G02F1/136209 takes precedence
• CPC Class Codes: G02F 1/133516 Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Abstract

A color filter and fabricating method thereof. The color filter includes a transparent substrate, provided with a plurality of parallel first light-shielding lines, extending in a first direction, and a plurality of parallel second light-shielding lines, extending in a second direction, wherein a sub-pixel area is defined by two adjacent first light-shielding lines and two adjacent second light-shielding lines. A color-filtering area is formed in the sub-pixel area. An electrode layer is formed on the transparent substrate. At least one insulating line is formed on the electrode layer, directly above a part of the first or the second light-shielding lines, and a conductive line is formed on the insulating line, extending over both ends of the insulating line to electrically connect the electrode layer.

Claims

1. :

A color filter, applicable for an LCD panel, comprising;

a transparent substrate with a plurality of parallel first light-shielding lines, extending in a first direction, and a plurality of parallel second light-shielding lines, extending in a second direction, formed thereon, wherein a sub-pixel area is defined by two adjacent first light-shielding lines and two adjacent second light-shielding lines;

a color-filtering area in the sub-pixel area;

an electrode layer on the transparent substrate;

at least one insulating segment on a part of the electrode layer, directly over the first or the second light-shielding lines; and

a conductive segment on the insulating segment and extending along two opposite sidewalls of the insulating segment to electrically connect the electrode layer at opposite sides of the insulating segment.

2. :

The color filter as claimed in claim 1, wherein the transparent substrate is glass.

3. :

The color filter as claimed in claim 1, wherein the first and second light-shielding lines are made of Cr.

4. :

The color filter as claimed in claim 1, wherein the electrode layer is an indium tin oxide or indium zinc oxide layer.

5. :

The color filter as claimed in claim 1, wherein the insulating segment is formed directly over the first light-shielding line.

6. :

The color filter as claimed in claim 1, wherein the conductive segment is made of Cr, Al or AlNd.

7. :

The color filter as claimed in claim 1, further comprising a plurality of insulating segments, each formed directly over respective first light-shielding lines.

8. :

The color filter as claimed in claim 7, further comprising a plurality of conductive segments, each formed directly over respective first light-shielding lines.

9. :

The color filter as claimed in claim 7, wherein the first and the second directions are perpendicular.

10. :

A method of fabricating a color filter for an LCD panel, comprising;

providing a transparent substrate with a plurality of parallel first light-shielding lines, extending in a first direction, and a plurality of parallel second light-shielding lines, extending in a second direction, formed thereon, wherein a sub-pixel area is defined by two adjacent first light-shielding lines and two adjacent second light-shielding lines;

forming a color-filtering area in the sub-pixel area;

forming an electrode layer on the transparent substrate;

forming at least one insulating segment on a part of the electrode layer, directly over the first or the second light-shielding lines; and

forming a conductive segment on the insulating segment and extending along two opposite sidewalls of the insulating segment to electrically connect the electrode layer at opposite sides of the insulating segment.

11. :

The method as claimed in claim 10, wherein the transparent substrate is glass.

12. The method as claimed in claim 10, wherein the first and second light-shielding lines are made of Cr.

13. :

The method as claimed in claim 10, wherein the electrode layer is an indium tin oxide or indium zinc oxide layer.

14. :

The method as claimed in claim 10, wherein the insulating segment is formed directly over the first light-shielding line.

15. :

The method as claimed in claim 10, wherein the conductive segment is made of Cr, Al or AlNd.

16. :

The method as claimed in claim 10, further comprising a step of forming a plurality of insulating segments on the electrode layer, each formed directly over respective first light-shielding lines.

17. :

The method as claimed in claim 16, further comprising a step of forming a plurality of conductive segments on the insulating lines.

18. :

The method as claimed in claim 10, wherein the first and the second directions are perpendicular.

19. :

The method as claimed in claim 10, wherein the insulating segment and conductive segment are formed by respective photolithography.