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Imaging device in a projection exposure facility

  • US 20040263812A1
  • Filed: 08/20/2004
  • Published: 12/30/2004
  • Est. Priority Date: 12/19/2001
  • Status: Active Grant
First Claim
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1. An imaging device in a projection exposure machine for microlithography, comprising at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element, characterized in that the linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17), the subregions (14, 15) being interconnected at least temporarily via functional elements (18) with an active direction at least approximately perpendicular to the movement axis (17) and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).

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