Imaging device in a projection exposure facility
First Claim
1. An imaging device in a projection exposure machine for microlithography, comprising at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element, characterized in that the linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17), the subregions (14, 15) being interconnected at least temporarily via functional elements (18) with an active direction at least approximately perpendicular to the movement axis (17) and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).
2 Assignments
0 Petitions
Accused Products
Abstract
An imaging device (7) in a projection exposure machine (1) for microlithography has at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41), having a linear drive (11), for manipulating the position of the optical element (10, 33, 34). The linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17). The subregions (14, 15) are interconnected at least temporarily via functional elements (18) with an active axis (17) [sic] and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).
29 Citations
8 Claims
- 1. An imaging device in a projection exposure machine for microlithography, comprising at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element, characterized in that the linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17), the subregions (14, 15) being interconnected at least temporarily via functional elements (18) with an active direction at least approximately perpendicular to the movement axis (17) and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).
Specification