Projection optical system for maskless lithography

• US 20040263813A1
• Filed: 06/24/2003
• Published: 12/30/2004
• Est. Priority Date: 06/24/2003
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Oskotsky, Mark, Smirnov, Stanislav
• Granted Patent: US 7,110,082 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, an optical element can be located between the beam splitter and the SLM, possibly to correct for aberrations.

Claims

1. A maskless lithography system comprising:

an illuminating system;

an SLM having a non-linear shape;

an exposure system; and

a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system.

2. The system of claim 1, wherein the SLM has a curved.

3. The system of claim 1, wherein the SLM has a concave shape.

4. The system of claim 1, wherein the SLM has a spherical shape.

5. The system of claim 1, further comprising an optical element positioned between the beam splitter and the SLM.

6. A maskless lithography system comprising:

means for illuminating that generates light;

means for directing the light;

means for patterning the light after it is received from the means for directing, the means for patterning the light having a non-linear patterning surface; and

means for exposing an object with the patterned light.

7. The system of claim 6, wherein the non-linear patterning surface is curved.

8. The system of claim 6, wherein the non-linear patterning surface has a concave shape.

9. The system of claim 6, wherein the non-linear patterning surface has a spherical shape.

10. The system of claim 6, wherein the means for directing comprises a means for splitting the light.

11. The system of claim 10, wherein the means for directing further comprises a means for correcting aberrations in the light.

12. A spatial light modulator having a non-linear shape comprising:

a non-linear support surface; and

active areas coupled to conform to a shape of the non-linear support surface.