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Projection optical system for maskless lithography

  • US 20040263813A1
  • Filed: 06/24/2003
  • Published: 12/30/2004
  • Est. Priority Date: 06/24/2003
  • Status: Active Grant
First Claim
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1. A maskless lithography system comprising:

  • an illuminating system;

    an SLM having a non-linear shape;

    an exposure system; and

    a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system.

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