Lithographic apparatus and device manufacturing method

• US 20040263816A1
• Filed: 04/23/2004
• Published: 12/30/2004
• Est. Priority Date: 05/12/2003
• Status: Abandoned Application

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Dam, Marinus Johannes Maria
• Application Number:
  US10/830,424
• Publication Number:
  US 20040263816A1
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
• CPC Class Codes: G03F 7/701 Off-axis setting using an aperture
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
• CPC Class Codes: G03F 7/70566 Polarisation control

Abstract

A method and apparatus, in particular for microlithographic exposure, comprising a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. Embodiments of the invention divide the projection beam into regions and select which features on the mask will be illuminated by which regions of the projection beam.

Claims

1. A lithographic apparatus comprising:

a support structure for supporting a patterning device, the patterning device serving to pattern a projection beam according to a desired pattern;

a substrate table for holding a substrate; and

a projection system for projecting the patterned beam onto a target portion of the substrate; and

an optical system configured and arranged to provide said projection beam with a first part and a second part for cooperation with the patterning device having a first patterning region and a second patterning region such that radiation in said second part of said projection beam is substantially prevented from being incident on said first patterning region of said patterning device.

2. A lithographic apparatus according to claim 1, wherein said optical system is configured and arranged such that radiation in said first part of said projection beam is substantially prevented from being incident on said second patterning region of said patterning device.

3. A lithographic apparatus according to claim 1, wherein said optical system is configured to provide said second part of said projection beam in a first substantially polarized state.

4. A lithographic apparatus according to claim 3, wherein said optical system is configured to provide said first part of said projection beam in a second substantially polarized state that is substantially different from said first polarized state.

5. A patterning device for use in a lithographic apparatus including a projection beam having first and second parts, comprising:

a first patterning region and a second patterning region;

an optical member covering the first patterning region so as to substantially prevent radiation from the second part of the projection beam from being incident upon the first patterning region.

6. A patterning device according to claim 5, wherein said patterning device comprises a second optical member covering said second patterning region so as to substantially prevent radiation from said first part of said projection beam from being incident upon said second patterning region.

7. A patterning device according to claim 5, wherein the optical member comprises a polarizing member.

8. A patterning device according to claim 6, wherein at least one of the optical members comprises a polarizing member.

9. A patterning device according to claim 5, wherein said first patterning region comprises at least one feature which is elongated in a first direction, and wherein said first optical member selectively allows radiation from said first part of said projection beam, linearly-polarized in a second direction substantially parallel to said first direction, to be incident upon said first patterning region.

10. A patterning device according to claim 5, wherein the patterning device further comprises an optical attenuator covering a region of said patterning device so as to reduce the intensity of radiation being incident upon said region.

11. A device manufacturing method comprising:

providing a projection beam of radiation comprising a first part and a second part;

using a patterning device with a first patterning region and a second patterning region, said patterning device substantially preventing radiation from said second part of said projection beam from being incident upon said first patterning region of said patterning device;

patterning the projection beam with a pattern in its cross-section using a patterning device; and

projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material.

12. A device manufacturing method according to claim 11, wherein said patterning device substantially prevents radiation from said first part of said projection beam from being incident upon said second patterning region of said patterning device.

13. A device manufacturing method according to claim 11, wherein said second part of said projection beam is in a first substantially polarized state.

14. A device manufacturing method according to claim 13, wherein said first part of said projection beam is in a second substantially polarized state that is substantially different from said first polarized state.

15. A device manufacturing method according to claim 11, wherein the patterning device further comprises an optical attenuator covering a region of said patterning device so as to substantially reduce the intensity of radiation being incident upon said region.

16. A lithographic apparatus comprising:

a support structure for supporting a patterning device, the patterning device serving to pattern a projection beam according to a desired pattern;

a substrate table for holding a substrate; and

a projection system for projecting the patterned beam onto a target portion of the substrate,

wherein said patterning device comprises an optical attenuator covering a patterning region of said patterning device so as to substantially reduce the intensity of radiation being incident upon said patterning region.