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Lithographic apparatus, device manufacturing method and device manufacturing thereby

  • US 20040263846A1
  • Filed: 04/16/2004
  • Published: 12/30/2004
  • Est. Priority Date: 08/24/2000
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a support structure for supporting a patterning device, the patterning device serving to pattern a beam of radiation according to a desired pattern;

    a substrate table for holding a substrate;

    a projection system for projecting the patterned beam onto a target portion of the substrate; and

    a displacement measuring system for measuring the position of a moveable object comprising one of said support structure and said substrate table in at least two degrees of freedom, said displacement measuring system comprising at least one grid grating mounted on said moveable object and at least one sensor head for measuring displacements of said grid grating in two degrees of freedom.

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