Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces
First Claim
1. An apparatus for fast, quantitative, non-contact topographic investigation of samples, comprising:
- a light source;
a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated;
a structured mask located between said light source and said concave mirror; and
an image sensor structured and arranged to receive a beam reflected from the sample and said concave mirror, wherein relative positions of said mask and said sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor.
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Abstract
Apparatus and process for fast, quantitative, non-contact topographic investigation of samples. Apparatus includes a light source, and a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated. A structured mask is located between the light source and the concave mirror, and an image sensor structured and arranged to receive a beam reflected from the sample and the concave mirror. Relative positions of the mask and the sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.
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Citations
30 Claims
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1. An apparatus for fast, quantitative, non-contact topographic investigation of samples, comprising:
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a light source;
a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated;
a structured mask located between said light source and said concave mirror; and
an image sensor structured and arranged to receive a beam reflected from the sample and said concave mirror, wherein relative positions of said mask and said sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A process for fast, quantitative, non-contact topographic investigation of samples, comprising:
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directing light through a structured mask onto a concave mirror;
directing collimated light to a sample to be investigated; and
receiving a beam reflected from the sample and the concave mirror; and
positioning the mask and the sensor in relation to the mirror and the sample to provide an essentially sharp image of the mask on the sensor. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30)
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Specification