Thin film precursor stack for MEMS manufacturing
First Claim
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1. A method for fabricating a MEMS device, the method comprising:
- processing a pre-fabricated thin film stack to define the MEMS device.
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Abstract
This invention provides a precursor film stack for use in the production of MEMS devices. The precursor film stack comprises a carrier substrate, a first layer formed on the carrier substrate, a second layer of an insulator material formed on the first layer, and a third layer of a sacrificial material formed on the second layer.
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Citations
16 Claims
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1. A method for fabricating a MEMS device, the method comprising:
processing a pre-fabricated thin film stack to define the MEMS device. - View Dependent Claims (2, 3)
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4. A precursor film stack for use in the production of MEMS devices, the precursor film stack comprising:
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a carrier substrate;
a first layer formed on the carrier substrate;
a second layer of an insulator material formed on the first layer; and
a third layer of a sacrificial material formed on the second layer. - View Dependent Claims (5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification