Composite coating device and method of forming overcoat on magnetic head using the same
First Claim
1. A composite coating device for forming a coating on a magnetic head, comprising:
- a first processing chamber for performing an ion beam etching process in which an ion beam is irradiated on a surface of the magnetic head at a predetermined angle to clean the surface, a second processing chamber for performing a magnetron sputter deposition in which a shock absorbing coating is formed on the surface, a third processing chamber for performing one of an electron cyclotron resonance plasma chemical vapor epitaxy and a cathode arc discharge deposition in which a protection coating is formed on the shock absorbing coating, and a preparation chamber communicating with the first to third processing chambers through opening and closing means for transferring the magnetic head.
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Accused Products
Abstract
A composite coating device includes first to third processing chambers. The first processing chamber performs an ion beam etching as a pretreatment process in which an ion beam is irradiated on a surface of a magnetic head at a predetermined angle and the surface is removed for a predetermined depth. The second processing chamber performs a magnetron sputter deposition as a shock absorbing coating formation process in which a shock absorbing coating is formed on the pretreated surface. The third processing chamber performs an electron cyclotron resonance plasma chemical vapor epitaxy or a cathode arc discharge deposition as an overcoat formation process in which an overcoat is formed on the shock absorbing coating. A preparation chamber communicates with the first to third processing chambers through opening and closing devices for transferring the magnetic head.
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Citations
9 Claims
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1. A composite coating device for forming a coating on a magnetic head, comprising:
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a first processing chamber for performing an ion beam etching process in which an ion beam is irradiated on a surface of the magnetic head at a predetermined angle to clean the surface, a second processing chamber for performing a magnetron sputter deposition in which a shock absorbing coating is formed on the surface, a third processing chamber for performing one of an electron cyclotron resonance plasma chemical vapor epitaxy and a cathode arc discharge deposition in which a protection coating is formed on the shock absorbing coating, and a preparation chamber communicating with the first to third processing chambers through opening and closing means for transferring the magnetic head. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification