Composite coating device and method of forming overcoat on magnetic head using the same

• US 20040264044A1
• Filed: 05/27/2004
• Published: 12/30/2004
• Est. Priority Date: 06/24/2003
• Status: Active Grant

• Current Assignee: Shimadzu Corporation
• Original Assignee: Shimadzu Corporation
• Inventors: Ueda, Masahiro, Suzuki, Masayasu, Konishi, Yoshiyuki
• Granted Patent: US 7,862,694 B2
• Time in Patent Office: Days
• US Class Current: 360/110
• CPC Class Codes: C23C 14/022 by means of bombardment with energetic particles or radiation
• CPC Class Codes: C23C 14/325 Electric arc evaporation
• CPC Class Codes: C23C 14/568 Transferring the substrates through a series of coating stations C23C14/562 takes precedence
• CPC Class Codes: C23C 16/511 using microwave discharges
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating
• CPC Class Codes: G11B 5/102 Manufacture of housing
• CPC Class Codes: G11B 5/127 Structure or manufacture of heads, e.g. inductive
• CPC Class Codes: G11B 5/187 Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features G11B5/265, G11B5/29 , G11B5/31 take precedence
• CPC Class Codes: G11B 5/255 comprising means for protection against wear in thin film structures G11B5/3106
• CPC Class Codes: G11B 5/3106 where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination G11B5/3133 takes precedence
• CPC Class Codes: G11B 5/40 Protective measures on heads, e.g. against excessive temperature G11B5/31 takes precedence; protection against wear G11B5/255 ; protective structure of the head: see under structures, e.g. G11B5/3106

Abstract

A composite coating device includes first to third processing chambers. The first processing chamber performs an ion beam etching as a pretreatment process in which an ion beam is irradiated on a surface of a magnetic head at a predetermined angle and the surface is removed for a predetermined depth. The second processing chamber performs a magnetron sputter deposition as a shock absorbing coating formation process in which a shock absorbing coating is formed on the pretreated surface. The third processing chamber performs an electron cyclotron resonance plasma chemical vapor epitaxy or a cathode arc discharge deposition as an overcoat formation process in which an overcoat is formed on the shock absorbing coating. A preparation chamber communicates with the first to third processing chambers through opening and closing devices for transferring the magnetic head.

Claims

1. A composite coating device for forming a coating on a magnetic head, comprising:

a first processing chamber for performing an ion beam etching process in which an ion beam is irradiated on a surface of the magnetic head at a predetermined angle to clean the surface,

a second processing chamber for performing a magnetron sputter deposition in which a shock absorbing coating is formed on the surface,

a third processing chamber for performing one of an electron cyclotron resonance plasma chemical vapor epitaxy and a cathode arc discharge deposition in which a protection coating is formed on the shock absorbing coating, and

a preparation chamber communicating with the first to third processing chambers through opening and closing means for transferring the magnetic head.

2. A composite coating device according to claim 1, further comprising an ion beam etching device disposed in the first processing chamber and including an ion source for generating ions, an electrode disposed in the ion source for leading ions and having a first grid with positive potential and a second grid with negative potential, and a communicating port disposed in the ion source for communicating a plasma generating area and an outside of the plasma generating area and removing effect of the second grid relative to electrons in the plasma generating area.

3. A composite coating device according to claim 2, wherein said ion beam etching device further includes a dielectric block situated in the plasma generating area for adjusting a density distribution of plasma.

4. A composite coating device according to claim 2, wherein said ion beam etching device further includes a plasma generating chamber, an electric insulation dividing wall protruding into the plasma generating chamber for separating the plasma generating chamber from outside, and an excitation coil disposed in a concave portion of the electric insulation dividing wall.

5. A composite coating device according to claim 1, further comprising a substrate holder disposed in the first processing chamber for rotatably holding the magnetic head so that the ion beam is irradiated on the surface of the magnetic head at the predetermined angle.

6. A composite coating device according to claim 1, wherein said shock absorbing coating is formed of a silicon layer, and said protection coating is formed of a carbon layer.

7. A composite coating device according to claim 6, wherein said silicon coat is formed of an amorphous silicon, and said carbon layer is formed of diamond-like carbon or tetrahedral amorphous carbon.

8. A method of forming a coating on a magnetic head, comprising an ion beam etching, magnetron sputter deposition, and one of electron cyclotron resonance plasma chemical vapor epitaxy and cathode arc discharge deposition using the composite coating device according to claim 1.

9. A magnetic head formed by the method according to claim 8.