Bonding for a micro-electro-mechanical system (MEMS) and MEMS based devices

• US 20040266048A1
• Filed: 07/26/2004
• Published: 12/30/2004
• Est. Priority Date: 02/27/2002
• Status: Active Grant

• Current Assignee: Honeywell International Inc.
• Original Assignee: Honeywell International Inc.
• Inventors: Platt, William P., Ford, Carol M.
• Granted Patent: US 7,132,721 B2
• Time in Patent Office: Days
• US Class Current: 438/50
• CPC Class Codes: B81C 1/00269 Bonding of solid lids or wafers to the substrate
• CPC Class Codes: B81C 2203/0109 Bonding an individual cap on the substrate
• CPC Class Codes: B81C 2203/038 Bonding techniques not provided for in B81C2203/031 - B81C2203/037
• CPC Class Codes: H01L 2224/48247 connecting the wire to a bond pad of the item

Abstract

A method of bonding and packaging components of Micro-Electro-Mechanical Systems (MEMS) and MEMS based devices using a Solid-Liquid InterDiffusion (SLID) process is provided. A micro-machine is bonded to a micro-machine chip using bonding materials. A layer of chromium is first deposited onto surfaces of the micro-machine and the micro-machine chip followed by a layer of gold. Subsequently, a layer of indium is deposited between the layers of gold, and the surface of the micro-machine is pressed against the surface of the micro-machine chip forming a gold-indium alloy to serve as a bond between the micro-machine and the micro-machine chip. In addition, a cover is bonded to the micro-machine chip in the same manner providing a hermetic seal for the MEMS based device.

Claims

1. A Micro-Electro-Mechanical System (MEMS) comprising in combination:

a substrate comprising a base;

a micro-machine coupled to the substrate; and

a cover coupled to the substrate, the cover mounted over the micro-machine,

wherein the cover and the micro-machine are coupled to the substrate by forming at least one bond between the cover and the substrate and between the micro-machine and the substrate, wherein the cover, the micro-machine, and the substrate each have mating surfaces at which the at least one bond may be formed, and wherein the at least one bond is formed by;

depositing a first layer of material on a first mating surface, wherein the first layer of material is selected from the group consisting of gold and tin;

depositing a second layer of material on a second mating surface, wherein the second layer of material is selected from the group consisting of indium and lead; and

pressing the first layer of material to the second layer of material, thereby forming an alloy to serve as the at least one bond between the mating surfaces of the cover and the substrate and between the mating surfaces of the micro-machine and the substrate.

2. The MEMS of claim 1, wherein the alloy serving as the at least one bond is selected from the group consisting of a gold-indium alloy, a gold-lead alloy, a tin-indium alloy, and a tin-lead alloy.

3. The MEMS of claim 1, wherein the at least one bond is formed by a Solid-Liquid InterDiffusion (SLID) bonding process.

4. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material at a temperature between about 20°

C. to about 200°

C.

5. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material at a pressure of about 2 pounds per square inch.

6. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material for about 6 hours.

7. The MEMS of claim 1, wherein the first layer of material has a thickness between about 100 Angstroms to about 0.25 inches.

8. The MEMS of claim 1, wherein the second layer of material has a thickness between about 50 Angstroms to about 0.125 inches.

9. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material at a pressure of about 2 pounds per square inch and at a temperature of about 100°

C.

10. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material for about 6 hours at a pressure of about 2 pounds per square inch.

11. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material for about 6 hours at a temperature of about 100°

C.

12. The MEMS of claim 1, wherein the at least one bond is formed by depositing a first layer of mating material on the first mating surface and depositing a second layer of mating material on the second mating surface prior to depositing the first layer of material on the first mating surface and depositing the second layer of material on the second mating surface.

13. The MEMS of claim 2, wherein the first layer of mating material and the second layer of mating material are comprised of layers of chromium each having a thickness between about 5 Angstroms to about 100 Angstroms.

14. The MEMS of claim 1 further comprising a plurality of components movably coupled to the micro-machine, the plurality of components operable to perform mechanical operations.

15. The MEMS of claim 4, wherein the cover includes a cavity to provide open space to allow the plurality of components to move freely.

16. The MEMS of claim 1, wherein the at least one bond is formed by pressing the first layer of material to the second layer of material using an effective amount of pressure and temperature, for an effective amount of time to form the alloy to serve as the at least one bond between the mating surfaces of the cover and the substrate and between the mating surfaces of the micro-machine and the substrate.

17. The MEMS of claim 1, wherein the MEMS is a ring-laser gyroscope.

18. A Micro-Electro-Mechanical System (MEMS) comprising:

a substrate having a mating surface; and

a micro-machine having a mating surface and being coupled to the substrate by forming a bond between the micro-machine and the substrate, wherein the bond is formed by;

depositing a first layer of mating material on the mating surface of the substrate;

depositing a first layer of bonding material on the first layer of mating material, wherein the first layer of bonding material is selected from the group consisting of gold and tin;

depositing a second layer of mating material on the mating surface of the micro-machine; and

depositing a second layer of bonding material on the second layer of mating material, wherein the second layer of bonding material is selected from the group consisting of indium and lead; and

pressing the micro-machine to the substrate, thereby forming an alloy to serve as the bond between the mating surfaces of the substrate and the micro-machine.

19. The MEMS of claim 18, further comprising a cover coupled to the substrate, the cover being mounted over the micro-machine.

20. The MEMS of claim 18, wherein the MEMS is a ring-laser gyroscope.