Plasma processing apparatus and plasma processing method
First Claim
1. A plasma processing apparatus, comprising:
- at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
plurality of waveguides provided on a single plane, each waveguide being coupled with the electromagnetic wave-distributing waveguide portion;
a plurality of slots provided in each of the waveguides;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides.
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Abstract
A plasma processing apparatus includes at least one electromagnetic wave source for generating an electromagnetic wave, an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source, a plurality of waveguides each coupled with the electromagnetic wave-distributing waveguide portion, the waveguides being provided on the same plane, a plurality of slots provided in each of the waveguides, at least one electromagnetic wave radiating window provided to face each slot, and a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electromagnetic wave radiating window. The electromagnetic wave-distributing waveguide portion is provided on the plural waveguides.
21 Citations
19 Claims
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1. A plasma processing apparatus, comprising:
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at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
plurality of waveguides provided on a single plane, each waveguide being coupled with the electromagnetic wave-distributing waveguide portion;
a plurality of slots provided in each of the waveguides;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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2. A plasma processing apparatus, comprising:
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at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
a plurality of waveguides each having an electric field plane and a magnetic field plane perpendicular to the electric field plane and provided on the same plane;
a plurality of slots provided in each of the waveguides;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the plural waveguides are equal to each other in the length in the propagating direction of the electromagnetic wave, and the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides and coupled with each of the waveguides in the magnetic field plane of the waveguide.
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3. A plasma processing apparatus, comprising:
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at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
a plurality of waveguides coupled with the electromagnetic wave-distributing waveguide portion and provided in parallel on the same plane;
a plurality of slots provided in each of the plural waveguides;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the plural waveguides are equal to each other in the length in the propagating direction of the electromagnetic wave, and the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides in a manner to cross each of the waveguides at right angles.
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4. A plasma processing apparatus, comprising:
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at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
a plurality of waveguides each coupled with the electromagnetic wave-distributing waveguide portion, the waveguides being formed on the same plane;
a plurality of slots provided in each of the waveguides;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides and is coupled with each of the waveguides with a cross-guide coupler interposed therebetween.
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5. A plasma processing apparatus, comprising:
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at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
a plurality of waveguides each coupled with the electromagnetic wave-distributing waveguide portion, the waveguides being formed on the same plane;
a plurality of slots provided in each of the plural waveguide;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides, and an electromagnetic wave absorber is provided in an edge portion of each waveguide in a direction opposite to the propagating direction of the electromagnetic wave.
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6. A plasma processing apparatus, comprising:
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at least one electromagnetic wave source for generating an electromagnetic wave;
an electromagnetic wave-distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source;
a plurality of waveguides each coupled with the electromagnetic wave-distributing waveguide portion and provided in parallel on the same plane;
a plurality of slots provided in each of the plural waveguides;
at least one electromagnetic wave radiating window provided to face each slot; and
a vacuum vessel in which a plasma is generated by the electromagnetic wave radiated from the electro-magnetic wave radiating window, wherein the electromagnetic wave-distributing waveguide portion is provided on the plural waveguides, and the distance between the inner surfaces of the adjacent waveguides is set shorter than the distance between the mutually facing inner surfaces of the waveguide, the inner surfaces extending in parallel.
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Specification