Lithographic apparatus and device manufacturing method

• US 20050002004A1
• Filed: 06/14/2004
• Published: 01/06/2005
• Est. Priority Date: 06/27/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Kolesnychenko, Aleksey Yurievich, Van Der Werf, Jan Evert
• Granted Patent: US 7,012,673 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.

Claims

1. A lithographic projection apparatus comprising:

an illumination system arranged to condition a radiation beam;

a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to supply a liquid between the projection system and the substrate and arranged, such that in use, there is a space not occupied by liquid between the liquid and the substrate.

2. An apparatus according to claim 1, wherein a distance between the liquid and the substrate is smaller than the wavelength of the radiation beam.

3. An apparatus according to claim 1, wherein a distance between the liquid and the substrate is less than 100 nm.

4. An apparatus according to claim 1, wherein the majority of the surface of the liquid closest to the substrate is substantially parallel to the substrate.

5. An apparatus according to claim 1, wherein the liquid supply system comprises a hydrophobic surface configured to define a shape of the liquid.

6. An apparatus according to claim 5, wherein the hydrophobic surface is of annular shape.

7. An apparatus according to claim 1, comprising a radiation-transmissive hydrophilic surface configured to define a shape of the liquid.

8. An apparatus according to claim 7, wherein the radiation-transmissive hydrophilic surface is circular, filling a hole at the center of an annular hydrophobic surface.

9. An apparatus according to claim 1, wherein, in use, the substrate table is vertically above the projection system.

10. An apparatus according to claim 1, comprising an electrode configured to adjust the shape of the liquid.

11. A device manufacturing method comprising:

providing a liquid between a projection system of a lithographic apparatus and a substrate, the liquid forming a liquid lens; and

projecting a patterned radiation beam through the liquid, then through a space, and then onto a target portion of the substrate using the projection system.

12. A method according to claim 11, wherein a distance between the liquid and the substrate is smaller than the wavelength of the radiation beam.

13. A method according to claim 11, wherein a distance between the liquid and the substrate is less than 100 nm.

14. A method according to claim 11, wherein the majority of the surface of the liquid closest to the substrate is substantially parallel to the substrate.

15. A method according to claim 11, comprising defining a shape of the liquid using a hydrophobic surface.

16. A method according to claim 15, wherein the hydrophobic surface is of annular shape.

17. A method according to claim 11, comprising defining a shape of the liquid using a radiation-transmissive hydrophilic surface.

18. A method according to claim 17, wherein the radiation-transmissive hydrophilic surface is circular, filling a hole at the center of an annular hydrophobic surface.

19. A method according to claim 11, wherein, in use, the substrate is vertically above the projection system.

20. A method according to claim 11, comprising adjusting the shape of the liquid using an electrode.

21. A lithographic projection apparatus comprising:

an illumination system arranged to condition a radiation beam;

a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to supply a peripherally confined portion of liquid between the projection system and the substrate, the substrate being vertically above the configured portion of the liquid, and wherein a space exists between the confined portion of liquid and the substrate.