Lithographic apparatus and method of a manufacturing device

• US 20050002010A1
• Filed: 05/07/2004
• Published: 01/06/2005
• Est. Priority Date: 05/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Ottens, Joost Jeroen, Van Empel, Tjarko Adriaan Rudolf, Zaal, Koen Jacobus Johannes Maria, Van Meer, Aschwin Lodewijk Hendricus Johannes, Miedema, Jan Rein
• Granted Patent: US 7,327,438 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Abstract

A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

Claims

1. A lithographic projection apparatus comprising:

a radiation system for providing a projection beam of radiation;

a support structure for supporting a patterning device, said patterning device serving to pattern said projection beam according to a desired pattern to form a patterned beam;

a substrate holder for holding a substrate said substrate holder provided with a clamp to provide a holding force for pressing said substrate against said substrate holder;

a releasing structure constructed and arranged to apply a release force to release said substrate from said substrate holder against said holding force;

a projection system for projecting said patterned beam onto a target portion of said substrate; and

a controller for applying a release force that is reduced prior to final release.

2. A lithographic projection apparatus according to claim 1, wherein said controller controls said release force such that said release force at final release is less then 70% of a maximum release force.

3. A lithographic projection apparatus according to claim 2, wherein said controller controls said release force relative to a preset release height of said releasing device.

4. A lithographic projection apparatus according to claim 1, wherein said release force is chosen so as to generate a maximum angle of deflection of 2 mrad.

5. A lithographic projection apparatus according to claim 3, wherein said predetermined release height for a 200 mm substrate is smaller than 1.0 mm.

6. A lithographic projection apparatus according to claim 1, wherein said substrate holder comprises a protective rim for absorption of wear energy.

7. A lithographic projection apparatus according to claim 1, wherein said substrate is a substantially flat substrate and said substrate holder comprises a plurality of protrusions, each of said plurality of protrusions having an extremity, said extremities of said plurality of protrusions defining a substantially flat plane of support for supporting a substantially flat substrate.

8. A lithographic projection apparatus comprising:

a radiation system for providing a projection beam of radiation;

a support structure for supporting a patterning device, said patterning device serving to pattern said projection beam according to a desired pattern to form a patterned beam;

a substrate holder for holding a substrate said substrate holder provided with a clamp to provide a holding force for pressing said substrate against said substrate holder;

a releasing structure constructed and arranged to apply a release force to release said substrate from said substrate holder against said holding force;

a projection system for projecting said patterned beam onto a target portion of said substrate; and

said substrate holder comprises a protective rim for absorption of wear energy.

9. A method of a manufacturing device comprising:

providing a substrate that is at least partially covered by a layer of radiation-sensitive material;

providing a holding force for pressing the substrate against a substrate holder;

providing a projection beam of radiation using a radiation system;

using a patterning device to endow the projection beam with a pattern in its cross-section to form a patterned beam of radiation;

projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, applying a release force so as to release the substrate from the substrate holder against the holding force; and

controlling the application of the release force so as to apply the release force in a manner such that the release force is reduced prior to final release.

10. A method according to claim 9, further comprising:

controlling the application of the release force relative to a preset release height of a releasing structure.

11. A method according to claim 10, wherein one or both of the release force and the release height are determined in-process in an iterative way.

12. A method according to claim 10, wherein one or both of the release force and the release height are determined based on one or both of recently in-process applied release forces and release heights.

14. A method according to claim 10, wherein the release force and the release height are determined based on recently in-process applied release forces and release heights of a release structure.

13. A method of a manufacturing device comprising:

providing a substrate that is at least partially covered by a layer of radiation-sensitive material;

providing a holding force for pressing the substrate against a substrate holder;

providing a projection beam of radiation using a radiation system;

using a patterning device to endow the projection beam with a pattern in its cross-section to form a patterned beam of radiation;

projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;

applying a release force so as to release the substrate from the substrate holder against the holding force; and

determining one or both of the release force and an release height in-process in an iterative way.