Method of fabricating optical filters
First Claim
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1. A method of fabricating optical filters comprising:
- providing a substrate;
etching said substrate to form a plurality of freestanding layers; and
depositing a plurality of dielectric layers over an outer surface of each of said freestanding layers.
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Abstract
A method of fabricating optical filter is disclosed. The method includes providing the substrate and selectively etching the substrate to form a plurality of freestanding layers. A plurality of dielectric layers is disposed over an outer surface of each of the freestanding layers. The resultant optical filters may be used in a variety of applications including etalon applications.
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Citations
26 Claims
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1. A method of fabricating optical filters comprising:
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providing a substrate;
etching said substrate to form a plurality of freestanding layers; and
depositing a plurality of dielectric layers over an outer surface of each of said freestanding layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 25, 26)
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14. A method of fabricating an optical etalon, the method comprising:
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providing a substrate;
selectively etching said substrate to form at least two substantially parallel freestanding layers and handles; and
depositing a plurality of dielectric layers over an outer surface of said freestanding layers. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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21. A method of fabricating an etalon, the method comprising:
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providing a substrate;
selectively etching said substrate to form at least one freestanding layer;
depositing a plurality of dielectric layers over said at least one freestanding layer on opposed sidewalls of said freestanding layer; and
removing said freestanding layer. - View Dependent Claims (22, 23, 24)
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Specification