Optical element producing method, base material drawings method and base material drawing apparatus
First Claim
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1. A pattern drawing apparatus for forming a predetermined pattern on a base material having a pattern-drawn layer, comprising:
- a moving device to move a focus position of an electron beam relatively for the base material in accordance with the pattern-drawn layer having a curved surface; and
an electron beam irradiating device to conduct drawing a predetermined pattern by irradiating an electron beam to the pattern-drawn layer.
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Abstract
A method of working an optical element for producing an optical element having a microscopic pattern, comprising a pattern drawing step for forming a specified pattern corresponding to said optical element on a base material including a layer of pattern drawing object, wherein said layer of pattern drawing object has a curved surface, and said specified pattern is drawn by the application of an electron beam to said layer of pattern drawing object.
30 Citations
16 Claims
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1. A pattern drawing apparatus for forming a predetermined pattern on a base material having a pattern-drawn layer, comprising:
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a moving device to move a focus position of an electron beam relatively for the base material in accordance with the pattern-drawn layer having a curved surface; and
an electron beam irradiating device to conduct drawing a predetermined pattern by irradiating an electron beam to the pattern-drawn layer. - View Dependent Claims (2, 3, 4, 5)
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6. An optical element produced by a method comprising the steps of:
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drawing a predetermined pattern on a base material including a pattern-drawn layer on which the pattern is drawn, wherein the pattern-drawn layer has a curved surface and the predetermined pattern is drawn by irradiating an electron beam onto the curved surface of the pattern-drawn layer. - View Dependent Claims (7, 8, 9, 10, 11)
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12. An optical element produced by a method comprising the steps of:
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drawing a predetermined pattern on a base material including a pattern-drawn layer on which the pattern is drawn, wherein the pattern-drawn layer has a curved surface and the predetermined pattern is drawn by irradiating an electron beam onto the curved surface of the pattern-drawn layer;
wherein the drawing step is conducted for a first base material and a second base material, respectively;
forming a first molding die and a second molding die respectively based on the first and second base materials;
assembling a mold by arranging the first and second molding dies to be opposite to each other; and
conducting an injection molding for the mold so as to form an optical element having a configuration corresponding to the patterns drawn on the first and second base materials. - View Dependent Claims (13, 14, 15)
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16. A base material formed by a method comprising the steps of:
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providing a pattern-drawn layer having a curved surface; and
drawing a predetermined pattern by irradiating an electron beam onto the pattern-drawn layer to thereby form the base material.
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Specification