Lithographic apparatus, method of calibrating, and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
an array of individually controllable elements that patterns the projection beam;
a substrate table that includes an area for supporting a substrate;
a projection system that projects the patterned projection beam onto a target portion of the substrate; and
a detector moveable to a position that is in a path of the patterned projection beam and substantially in the area of the substrate table for supporting the substrate, the detector having detector elements, each of the detector elements being larger than a spot corresponding to a single pixel of the array of individually controllable elements.
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Abstract
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
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Citations
16 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a projection beam of radiation;
an array of individually controllable elements that patterns the projection beam;
a substrate table that includes an area for supporting a substrate;
a projection system that projects the patterned projection beam onto a target portion of the substrate; and
a detector moveable to a position that is in a path of the patterned projection beam and substantially in the area of the substrate table for supporting the substrate, the detector having detector elements, each of the detector elements being larger than a spot corresponding to a single pixel of the array of individually controllable elements. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of calibrating a lithographic apparatus, comprising:
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(a) patterning a projection beam using an array of individually controllable elements;
(b) directing the patterned projection beam towards a substrate table using a projection system;
(c) locating a detector having a plurality of detector elements in a path of the patterned projection beam, each of the detector elements being larger than a spot corresponding to a single element of the array of individually controllable elements;
(d) selectively activating the detector elements;
(e) measuring an amount of radiation received on respective ones of the detector elements from the patterned projection beam; and
(f) calibrating the lithographic projection apparatus based on the measuring step (e). - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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Specification