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Lithographic apparatus and device manufacturing method

  • US 20050007569A1
  • Filed: 05/13/2004
  • Published: 01/13/2005
  • Est. Priority Date: 05/13/2003
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus, comprising:

  • a radiation system configured to provide a beam of radiation;

    a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;

    a substrate table configured to hold a substrate;

    a projection system configured to project the patterned beam onto a target portion of the substrate and having an optical axis; and

    a liquid supply system configured to provide an immersion liquid on the substrate in a space between the projection system and the substrate, wherein at least part of the liquid supply system is free to move in the direction of the optical axis and/or rotate about at least one axis perpendicular to the optical axis.

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