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Method and apparatus for forming capping film

  • US 20050009340A1
  • Filed: 07/07/2004
  • Published: 01/13/2005
  • Est. Priority Date: 07/07/2003
  • Status: Abandoned Application
First Claim
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1. A method for forming a capping film for protecting a surface of interconnect metal, comprising:

  • preparing a metal catalyst solution for electroless plating containing a metal element nobler than interconnect metal and having dissolved oxygen concentration of 7 ppm or less;

    bringing said metal catalyst solution into contact with a surface of the interconnect metal to form a metal catalyst layer on the surface of the interconnect metal; and

    performing electroless to form a capping film on the surface of the interconnect metal.

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