Chamber, exposure apparatus, and device manufacturing method

• US 20050011581A1
• Filed: 06/03/2004
• Published: 01/20/2005
• Est. Priority Date: 06/05/2003
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Sakamoto, Eiji
• Granted Patent: US 7,078,706 B2
• Time in Patent Office: Days
• US Class Current: 141/65
• CPC Class Codes: F16C 2300/62 low pressure, e.g. elements operating under vacuum conditions
• CPC Class Codes: F16C 29/025 Hydrostatic or aerostatic this type of bearing for rotary parts F16C32/06
• CPC Class Codes: F16C 32/0603 supported by a gas cushion, e.g. an air cushion
• CPC Class Codes: F16C 33/748 flowing to or from the sealing gap, e.g. vacuum seals with differential exhaust
• CPC Class Codes: G03F 7/70841 Constructional issues related to vacuum environment, e.g. load-lock chamber
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus

Abstract

Disclosed is a chamber having a static-pressure bearing disposed therein, the chamber including an inside pressure gauge for detecting an inside pressure of said chamber, and a pressure controller for decreasing the inside pressure of the chamber on the basis of the detection made through the inside pressure gauge. This arrangement effectively prevents unwanted increase of the chamber inside pressure and avoids local breakage of the chamber.

Claims

1. A chamber having a static-pressure bearing disposed therein, said chamber comprising:

an inside pressure gauge for detecting an inside pressure of said chamber; and

a pressure controller for decreasing the inside pressure of said chamber on the basis of the detection made through said inside pressure gauge.

2. A chamber having a static-pressure bearing disposed therein, said chamber comprising:

a differential pressure gauge for detecting a differential pressure between an inside and an outside of said chamber; and

a pressure controller for decreasing the inside pressure of said chamber on the basis of the detection made through said differential pressure gauge.

3. A chamber having a static-pressure bearing disposed therein, said chamber comprising:

an inside pressure gauge for detecting an inside pressure of said chamber;

an outside pressure gauge for detecting an outside pressure of said chamber; and

a pressure controller for decreasing the inside pressure of said chamber on the basis of the detections made through said inside pressure gauge and said outside pressure gauge.

4. A chamber according to claim 3, wherein said pressure controller decreases the inside pressure of said chamber when the inside pressure of said chamber is higher than the outside pressure of said chamber.

5. A chamber according to claim 3, wherein said pressure controller decreases the inside pressure of said chamber when the inside pressure of said chamber is higher than the outside pressure of said chamber, by a predetermined amount.

6. A chamber according to claim 3, wherein said pressure controller includes a piping for communicating the inside of said chamber with the outside of said chamber, and an adjusting device for adjusting a degree of opening of said piping on the basis of the detections made through said inside pressure gauge and said outside pressure gauge.

7. A chamber according to claim 3, wherein said pressure controller includes a piping for communicating the inside of said chamber with the outside of said chamber, and a check valve for enabling flow of a gas from the inside of said chamber to the outside of said chamber and also for restricting a flow of a gas from the outside of said chamber to the inside of said chamber.

8. An exposure apparatus, comprising:

an exposure processing system for performing an exposure process to a substrate, said exposure processing system having a static-pressure bearing; and

a chamber having said exposure processing system accommodated therein, said chamber including (i) an inside pressure gauge for detecting an inside pressure of said chamber, (ii) an outside pressure gauge for detecting an outside pressure of said chamber, and (iii) a pressure controller for decreasing the inside pressure of said chamber on the basis of the detections made through said inside pressure gauge and said outside pressure gauge.

9. An apparatus according to claim 8, wherein said exposure processing system performs an exposure process to the substrate by use of one of X-ray beam, EUV light and electron beam, and wherein the inside of the chamber is controlled to provide a vacuum ambience there.

13. A device manufacturing method, comprising the steps of:

performing an exposure process to a substrate by use of an exposure apparatus as recited in claim 8;

and

developing the exposed substrate.

10. An exposure apparatus, comprising:

an irradiating system for projecting one of X-ray beam, EUV light and electron beam onto a substrate;

a stage for moving the substrate, said stage having a static-pressure bearing including a stationary portion and a movable portion, a predetermined gas being supplied to between the stationary portion and the movable portion of said bearing; and

a chamber having said irradiating system and said stage accommodated therein, said chamber being controlled to provide a vacuum ambience inside said chamber, and said chamber having a pressure controller for controlling an inside pressure of said chamber to prevent the inside pressure from exceeding a predetermined value as a result of the predetermined gas supplied to the static-pressure bearing.

11. An apparatus according to claim 10, wherein the predetermined gas is nitrogen, helium or inactive gas.

12. An apparatus according to claim 10, wherein said pressure controller includes a piping for communicating the inside of said chamber with the outside of said chamber, and an adjusting device for adjusting a degree of opening of said piping on the basis of the detections made through said inside pressure gauge and said outside pressure gauge.

14. A device manufacturing method, comprising the steps of:

performing an exposure process to a substrate by use of an exposure apparatus as recited in claim 10;

and

developing the exposed substrate.