Lithographic apparatus and device manufacturing method

• US 20050012916A1
• Filed: 05/21/2004
• Published: 01/20/2005
• Est. Priority Date: 05/22/2003
• Status: Abandoned Application

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Gui, Cheng-Qun, Van Der Mast, Karel Diederick, Hoefnagels, Johan Christiaan Gerard
• Application Number:
  US10/850,567
• Publication Number:
  US 20050012916A1
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A lithographic projection apparatus comprises a microlens array for generating a plurality of source images in a two-dimensional array, a programmable patterning means having a plurality of addressable elements acting as shutters for the source images and a projection subsystem for projecting a n image of the array of source images onto a substrate. A greater working distance can thereby be obtained

Claims

1. A lithographic projection apparatus, comprising:

an illumination system that supplies a projection beam of radiation;

programmable patterning device comprising a plurality of addressable elements that are set in a desired state in accordance with a desired pattern;

a projection system that transfers the desired pattern onto a target portion of a substrate, the projection system comprising,

a microlens array having a plurality of microlenses corresponding to the addressable elements of the programmable patterning device that form an array of source images; and

a projection subsystem that projects an image of the array of source images onto the substrate.

2. The apparatus of claim 1, wherein said illumination system delivers a substantially collimated beam of radiation to the microlens array which forms the array of source images therefrom, and said programmable patterning means is a selectively transmissive device positioned proximate to the microlens array whereby addressable elements of the programmable patterning devices are set to block respective ones of the source images.

3. The apparatus of claim 2, wherein the programmable patterning device is positioned substantially in an image plane of the source images.

4. The apparatus of claim 1, wherein the projection system further comprises a second projection subsystem that projects an image of the programmable patterning device onto the microlens array.

5. The apparatus of claim 4, wherein the programmable patterning device and the microlens arrays have at least one of different pitches or aspect ratios.

6. The apparatus of claim 5, wherein the second projection subsystem directs light from the addressable elements of the programmable patterning device to microlenses of the microlens array.

7. The apparatus of claim 6, wherein the second projection subsystem performs one of magnification or reduction of the directed light.

8. The apparatus of claim 1, wherein the microlens array is arranged to project the source images onto a spherical surface.

9. The apparatus of claim 1, wherein the projection subsystem projects a 1:

1 or reduced image of the source image array.

10. A device manufacturing method, comprising:

setting a plurality of addressable elements of a programmable patterning device in accordance with a desired pattern;

using the programmable patterning device to pattern a beam of radiation with the desired pattern;

transferring the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate, the transferring comprising,

using a microlens array having a plurality of microlenses corresponding to the addressable elements of the programmable patterning device to form an array of source images; and

using a projection subsystem for projecting an image of the array of source images onto the substrate.