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Al2O3 atomic layer deposition to enhance the deposition of hydrophobic or hydrophilic coatings on micro-electromechcanical devices

  • US 20050012975A1
  • Filed: 08/02/2004
  • Published: 01/20/2005
  • Est. Priority Date: 12/17/2002
  • Status: Active Grant
First Claim
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1. A method comprising:

  • depositing a layer including aluminum oxide over a MicroElectroMechanical System by using atomic layer deposition; and

    coating the layer by bonding alkylaminosilanes to surface hydroxyl groups of the aluminum oxide.

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