APPARATUS FOR PRODUCING THIN-FILM ELECTROLYTE

• US 20050016458A1
• Filed: 07/11/2003
• Published: 01/27/2005
• Est. Priority Date: 07/11/2003
• Status: Active Grant

• Current Assignee: Johnson Ip Holding Llc
• Original Assignee: Excellatron Solid State, LLC
• Inventors: Meda, Lamartine, Zhang, Ji-Guang, Maxie, Eleston
• Granted Patent: US 6,886,240 B2
• Time in Patent Office: Days
• US Class Current: 118/723.R
• CPC Class Codes: C23C 16/40 Oxides
• CPC Class Codes: C23C 16/5096 Flat-bed apparatus
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product
• CPC Class Codes: Y10T 29/49115 including coating or impregnating
• CPC Class Codes: Y10T 29/53135 Storage cell or battery

Abstract

An apparatus for producing a thin film electrolyte is provided wherein a volatile lithium-containing precursor and a volatile phosphate-containing precursor are mixed into a plasma generated from a plasma source. The mixture is then deposited upon a substrate. The apparatus has a plasma source (13) having a primary plenum (16) and a secondary plenum (23). The primary plenum is in fluid communication with a source of nitrogen gas (47) and a source of hydrogen gas (51). The secondary plenum is in fluid communication with a first bubbler (31) and a second bubbler (38).

Claims

1. An apparatus for producing a thin film electrolyte layer comprising,

means for generating a high density plasma from a supply of at least one plasma gas;

a substrate holder mounted adjacent said plasma generating means;

means for vaporizing a volatile lithium containing precursor;

means for vaporizing a volatile phosphate containing precursor;

means for transporting the vaporized volatile lithium containing precursor and expelling the vaporized volatile lithium containing precursor into the previously created high density plasma; and

means for transporting the vaporized volatile phosphate containing precursor and expelling the vaporized volatile phosphate containing precursor into the previously created high density plasma;

whereby the volatile lithium containing precursor and volatile phosphate containing precursor are prevented from mixing with the plasma gas prior to the plasma being created by the plasma generating means and are expelled only into the previously generated plasma to prevent decomposition of the precursors.

2. The apparatus of claim 1 wherein the volatile lithium containing precursor is selected from the group consisting of lithium tert-butoxide, lithium hexafluroisoproxide, and lithium tetramethyheptane dionate.

3. The apparatus of claim 1 wherein the volatile phosphate containing precursor is selected from the group consisting of triethylphosphate and trimethyle phosphate.

4. The apparatus of claim 3 wherein the volatile lithium containing precursor is selected from the group consisting of lithium tert-butoxide, lithium hexafluroisoproxide, and lithium tetramethyheptane dionate.

5. The apparatus of claim 1 wherein the plasma gas is non-reactive with the volatile lithium containing precursor.

6. The apparatus of claim 1 wherein the plasma gas is reactive with the volatile lithium containing precursor.

7. The apparatus of claim 6 wherein the plasma gas is selected from the group consisting of hydrogen and oxygen.

8. The apparatus of claim 1 wherein the means for vaporizing the volatile lithium containing precursor comprises a metal organic bubbler.

9. The apparatus of claim 1 wherein the means for vaporizing the volatile phosphate containing precursor comprises a metal organic bubbler.

10. An apparatus for producing a thin film battery electrolyte layer comprising,

(a) means for generating a plasma from a supply of plasma gas;

(b) means for vaporizing a volatile lithium containing precursor;

(c) means for vaporizing a volatile phosphate containing precursor;

(d) means for directing the vaporized volatile lithium containing precursor into the generated plasma;

(e) means for directing the vaporized volatile phosphate containing precursor into the generated plasma; and

(f) means for directing the plasma mixed with the volatile lithium containing precursor and the volatile phosphate containing precursor onto a substrate,

whereby the volatile lithium containing precursor and volatile phosphate containing precursor are mixed into the plasma gas only once the plasma is generated.

11. The apparatus of claim 10 wherein the volatile lithium containing precursor is selected from the group consisting of lithium tert-butoxide, lithium hexafluroisoproxide, and lithium tetramethyheptane dionate.

12. The apparatus of claim 10 wherein the volatile phosphate containing precursor is selected from the group consisting of triethylphosphate and trimethyle phosphate.

13. The apparatus of claim 12 wherein the volatile lithium containing precursor is selected from the group consisting of lithium tert-butoxide, lithium hexafluroisoproxide, and lithium tetramethyheptane dionate.

14. The apparatus of claim 10 wherein the plasma gas is non-reactive with the volatile lithium containing precursor.

15. The apparatus of claim 10 wherein the plasma gas is reactive with the volatile lithium containing precursor.

16. The apparatus of claim 15 wherein the plasma gas is selected from the group consisting of hydrogen and oxygen.

17. The apparatus of claim 10 wherein said means for vaporizing the volatile lithium containing precursor comprises a metal organic bubbler.

18. The apparatus of claim 10 wherein said means for vaporizing the volatile phosphate containing precursor comprises a metal organic bubbler.