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Ion source apparatus and cleaning optimized method thereof

  • US 20050016838A1
  • Filed: 06/04/2004
  • Published: 01/27/2005
  • Est. Priority Date: 06/06/2003
  • Status: Active Grant
First Claim
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1. A cleaning optimized method in which to remove insulation layers produced by ion source materials accreting to and collecting over each electrode surface of an extraction electrode system, in an ion source apparatus in which plasma is formed by supplying ion source gas to a plasma chamber, and ion beams are extracted from the plasma through the extraction electrode system comprising a plurality of electrodes by means of effect of electric field, wherein the method comprising the steps of:

  • supplying rare gas instead of the ion source gas to the plasma chamber thus forming plasma based on the rare gas;

    adjusting a setting parameter to change a diameter of ion beam of the rare gas when the ion beam extracted from the plasma chamber collides onto each electrode surface of the extraction electrode system; and

    focusing the diameter of the ion beam within an effective range in which intension of sputtering of the insulation layers is maximized thus evenly removing the insulation layers.

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