Lithographic apparatus and device manufacturing method

• US 20050018155A1
• Filed: 06/23/2004
• Published: 01/27/2005
• Est. Priority Date: 06/27/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Donders, Sjoerd Nicolaas Lambertus, Loopstra, Erik Roelof, Santen, Helmar Van, Kolesnychenko, Aleksey Yurievich, Hoogendam, Christiaan Alexander, Cox, Henrikus Herman Marie
• Granted Patent: US 7,119,874 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.

Claims

1. A lithographic projection apparatus comprising:

an illumination system arranged to condition a radiation beam;

a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a member extending along at least part of the boundary of the space; and

a liquid seal device configured to form a liquid seal between the member and the substrate.

2. Apparatus according to claim 1, wherein the liquid seal device comprises either a hydrostatic or a hydrodynamic bearing configured to at least partially support the member above a surface of the substrate.

3. Apparatus according to claim 2, wherein a pressure of the liquid in the hydrostatic or hydrodynamic bearing is in the range of 100 Pa to 100 kPa relative to an ambient pressure.

4. Apparatus according to claim 1, wherein the member further comprises a shared liquid outlet configured to remove liquid from the space and from the liquid seal device.

5. Apparatus according to claim 4, wherein the shared liquid outlet is located on a surface of the member which faces the substrate and is positioned between the space and the liquid seal device.

6. Apparatus according to claim 4, wherein the shared liquid outlet has a cross sectional area in a plane substantially parallel to the substrate which is greater than the cross sectional area of a liquid inlet.

7. Apparatus according to claim 1, wherein the liquid supply system further comprises a low pressure outlet configured to prevent leakage of liquid in an outward radial direction, the low pressure outlet located on a surface of the member which faces the substrate.

8. Apparatus according to claim 1, further comprising a bias device configured to apply a biasing force to the member that is directed towards a surface of the substrate.

9. Apparatus according to claim 1, further comprising a support member, connected between the member and a machine frame, configured to support the member.

10. Apparatus according to claim 1, wherein the member comprises a liquid inlet, a liquid outlet and a combined outlet for both liquid and gas.

11. Apparatus according to claim 1, wherein the liquid supply system is configured to supply liquid to the space at a rate of 0.1 to 10 liters per minute.

12. Apparatus according to claim 1, wherein the liquid supply system is configured to supply liquid to the space at a pressure which compensates for liquid transported away from the space by relative movement between the substrate and the member.

13. Apparatus according to claim 1, further comprising a chamber formed upstream of an inlet of the member, downstream of an outlet of the member, or both.

14. Apparatus according to claim 1, further comprising:

a sensor configured to establish the position of the member; and

a controller configured to control an actuator based on the position established by the sensor.

15. Apparatus according to claim 14, wherein the controller is configured to control the actuator to maintain a desired distance between a surface of the substrate and the member.

16. Apparatus according to claim 14, wherein the controller is configured to control the actuator to at least partly compensate for an external force on the member.

17. Apparatus according to claim 14, wherein the controller is configured to damp the member.

18. Apparatus according to claim 14, wherein the controller is configured to retract the member in the case of a system error.

19. Apparatus according to claim 14, wherein the seal comprises a hydrostatic or hydrodynamic bearing and the controller is configured to control the actuator to exert a pre-tension force on the bearing.

20. Apparatus according to claim 1, wherein an inlet of the member, an outlet of the member, or both has rounded edges.

21. Apparatus according to claim 1, wherein an edge of the member adjacent to a surface of the substrate is rounded.

22. A lithographic projection apparatus comprising:

an illumination system arranged to condition a radiation beam;

a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a member extending along at least part of the boundary of the space, wherein the member comprises a liquid inlet located on a surface of the member which faces the substrate.

23. Apparatus according to claim 22, wherein a height of the member above a surface of the substrate is greater in a region between the space and the liquid inlet than elsewhere.

24. Apparatus according to claim 23, wherein the liquid supply system further comprises a gas seal device positioned outwards in a radial direction from the liquid inlet, configured to form a gas seal between the member and a surface of the substrate.

25. Apparatus according to claim 22, wherein the member further comprises an intermediate gas inlet and a liquid outlet respectively positioned outwards in a radial direction from the liquid inlet and both located on the surface of the member which faces the substrate.

26. Apparatus according to claim 25, wherein a height of the member above a surface of the substrate is greater between the intermediate gas inlet and the liquid outlet than between the liquid inlet and the intermediate gas inlet.

27. Apparatus according to claim 22, wherein the liquid supply system further comprises a low pressure outlet configured to prevent leakage of liquid in an outward radial direction, the low pressure outlet located on a surface of the member which faces the substrate.

28. Apparatus according to claim 22, further comprising a bias device configured to apply a biasing force to the member that is directed towards a surface of the substrate.

29. Apparatus according to claim 22, further comprising a support member, connected between the member and a machine frame, configured to support the member.

30. Apparatus according to claim 22, wherein the member comprises a liquid inlet, a liquid outlet and a combined outlet for both liquid and gas.

31. Apparatus according to claim 22, wherein the liquid supply system is configured to supply liquid to the space at a rate of 0.1 to 10 liters per minute.

32. Apparatus according to claim 22, wherein the liquid supply system is configured to supply liquid to the space at a pressure which compensates for liquid transported away from the space by relative movement between the substrate and the member.

33. Apparatus according to claim 22, further comprising a chamber formed upstream of an inlet of the member, downstream of an outlet of the member, or both.

34. Apparatus according to claim 22, further comprising:

a sensor configured to establish the position of the member; and

a controller configured to control an actuator based on the position established by the sensor.

35. Apparatus according to claim 34, wherein the controller is configured to control the actuator to maintain a desired distance between a surface of the substrate and the member.

36. Apparatus according to claim 34, wherein the controller is configured to control the actuator to at least partly compensate for an external force on the member.

37. Apparatus according to claim 34, wherein the controller is configured to damp the member.

38. Apparatus according to claim 34, wherein the controller is configured to retract the member in the case of a system error.

39. Apparatus according to claim 34, wherein the seal comprises a hydrostatic or hydrodynamic bearing and the controller is configured to control the actuator to exert a pre-tension force on the bearing.

40. Apparatus according to claim 22, wherein an inlet of the member, an outlet of the member, or both has rounded edges.

41. Apparatus according to claim 22, wherein an edge of the member adjacent to a surface of the substrate is rounded.

42. A device manufacturing method comprising:

providing a liquid to a space between a projection system of a lithographic apparatus and a substrate, the space being bounded at least in part by a member;

forming a liquid seal between the substrate and the member; and

projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate.

43. Method according to claim 42, further comprising:

establishing a distance between a surface of the substrate and the member; and

controlling an actuator to maintain a desired distance between the surface of the substrate and the member based on the established distance.

44. Method according to claim 42, wherein the seal comprises either a hydrostatic or a hydrodynamic bearing to at least partially support the member above a surface of the substrate.

45. Method according to claim 42, further comprising preventing leakage of liquid in an outward radial direction by removing liquid, gas, or both using a low pressure outlet located on a surface of the member which faces the substrate.

46. A device manufacturing method comprising:

providing a liquid to a space between a projection system of a lithographic apparatus and a surface of the substrate, the liquid being provided via a liquid inlet provided on a member, the liquid inlet facing the surface of the substrate; and

projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate.

47. Method according to claim 46, further comprising:

establishing a distance between a surface of the substrate and the member; and

controlling an actuator to maintain a desired distance between the surface of the substrate and the member based on the established distance.

48. Method according to claim 46, further comprising preventing leakage of liquid in an outward radial direction by removing liquid, gas, or both using a low pressure outlet located on a surface of the member which faces the substrate.