Method and apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate and a substrate
First Claim
1. A method for removing an edge region of a layer applied to a substrate for use in a microlithographic process, in which method, a laser beam is imaged onto the edge region, wherein the laser beam removes the edge region by evaporation.
2 Assignments
0 Petitions
Accused Products
Abstract
The invention relates to a method and an apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate, in particular, with a photoresist layer. Furthermore, the present invention relates to a substrate, onto which a layer, in particular, a photoresist layer for use in a microlithographic process, is applied, wherein an edge region of the layer is removed according to the invention. In the method, a laser beam is imaged onto the edge region, and the edge region is removed by the laser beam. In this manner, the edge region can be removed reliably and precisely, without damage to or contamination of regions of the layer which are not to be removed.
38 Citations
23 Claims
- 1. A method for removing an edge region of a layer applied to a substrate for use in a microlithographic process, in which method, a laser beam is imaged onto the edge region, wherein the laser beam removes the edge region by evaporation.
-
10. A method for coating a substrate with a layer, in particular, with a photoresist layer, for use in a microlithographic process, in which method, a layer is applied to the substrate, and an edge region of the applied layer is removed by imaging a laser beam onto the edge region, so that the laser beam removes the edge region by evaporation.
- 11. An apparatus for removing an edge region of a layer applied to a substrate, for use in a microlithographic process, comprising a laser light source for emitting a laser beam, and imaging means for imaging the laser beam onto the edge region of the substrate, wherein the laser light source is adapted for removing the edge region by means of the laser beam by evaporation.
-
20. An apparatus for coating a substrate with a layer for use in a microlithographic process, comprising:
-
a coating device for applying the layer to the substrate;
a laser light source for emitting a laser beam; and
an imaging means for imaging the laser beam onto the edge region of the substrate, wherein the laser light source is adapted for removing of the edge region with the laser beam by evaporation.
-
- 21. A substrate, which is coated with a layer for use in a microlithographic process, wherein an edge region of the layer is removed by imaging a laser beam onto the edge region for removing the edge region by evaporation.
Specification