Selective reflectivity process chamber with customized wavelength response and method
First Claim
1. A system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, said system comprising:
- a heating arrangement for heating the treatment object using a heating arrangement radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object; and
chamber defining means for use in exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within a treatment chamber such that a first fraction of the heating arrangement radiated energy and a second fraction of the treatment object radiated energy are incident on a wall arrangement which forms part of the chamber defining means, and at least a portion of said wall arrangement is configured for responding in a first way to a majority of the first fraction of the heating arrangement radiated energy that is incident thereon and for responding in a second way to a majority of the second fraction of the treatment object radiated energy that is incident thereon.
4 Assignments
0 Petitions
Accused Products
Abstract
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy. The chamber responds in a first way to the heating arrangement radiated energy and in a second way to the treatment object radiated energy that is incident thereon. The chamber may respond in the first way by reflecting the majority of the heat source radiated energy and in the second way by absorbing the majority of the treatment object radiated energy. Different portions of the chamber may be treated with selectively reflectivity based on design considerations to achieve objectives with respect to a particular chamber performance parameter.
50 Citations
167 Claims
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1. A system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, said system comprising:
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a heating arrangement for heating the treatment object using a heating arrangement radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object; and
chamber defining means for use in exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within a treatment chamber such that a first fraction of the heating arrangement radiated energy and a second fraction of the treatment object radiated energy are incident on a wall arrangement which forms part of the chamber defining means, and at least a portion of said wall arrangement is configured for responding in a first way to a majority of the first fraction of the heating arrangement radiated energy that is incident thereon and for responding in a second way to a majority of the second fraction of the treatment object radiated energy that is incident thereon. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 105, 118, 119, 120)
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61. In a system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, a method comprising:
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providing a heating arrangement for heating the treatment object using a heat source radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object; and
defining a treatment chamber using chamber defining means for use in exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within the treatment chamber such that a first fraction of the heating arrangement radiated energy and a second fraction of the treatment object radiated energy are incident on a wall arrangement which forms part of the chamber defining means; and
configuring at least a portion of said wall arrangement to respond in a first way to a majority of the first fraction of the heating arrangement radiated energy that is incident thereon and to respond in a second way to a majority of the second fraction of the treatment object radiated energy that is incident thereon. - View Dependent Claims (62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96, 97, 98, 99, 100, 101, 102, 103, 104, 106, 107, 108, 109, 110, 111, 112, 113, 114, 115, 116, 117, 121)
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122. For use in a system for processing a treatment object, said system being usable with an unmodified chamber arrangement for receiving and supporting the treatment object during processing, said unmodified chamber arrangement providing a given magnum cooling rate of said treatment object after being heated within the unmodified chamber arrangement, a modified chamber arrangement that is usable in the system as an alternative to the unmodified chamber arrangement, said modified chamber arrangement comprising:
chamber defining means for supporting said treatment object therein and configured for use in providing a modified maximum cooling rate that is greater than said given maximum cooling rate. - View Dependent Claims (123, 124, 125, 126, 127, 128, 133)
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129. For use in a system for processing a treatment object, said system being usable with an unmodified chamber arrangement for receiving and supporting the treatment object during processing, said unmodified chamber arrangement providing a given maximum cooling rate of said treatment object after heating within the unmodified chamber arrangement, a method comprising:
configuring modified chamber defining means for supporting said treatment object therein and for use in providing a modified maximum cooling rate of said treatment object that is greater than said given maximum cooling rate. - View Dependent Claims (130, 131, 132, 134)
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135. A system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, said system comprising:
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a heating arrangement for heating the treatment object using a heat source radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object; and
chamber defining means for use in exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within a treatment chamber such that a first fraction of the heating arrangement radiated energy and a second fraction of the treatment object radiated energy are incident on a wall arrangement which forms a part of the chamber defining means, and at least a portion of said wall arrangement configured to respond with selective reflectivity to said first fraction of the heating arrangement radiated energy and said second fraction of the treatment object radiated energy.
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136. In a system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, a method comprising:
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heating the treatment object using a heating arrangement having a heat source radiated energy and a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object;
exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within a treatment chamber, that is defined by chamber defining means, such that a first fraction of the heating arrangement radiated energy and a second fraction of the treatment object radiated energy are incident on a wall arrangement which forms part of the chamber defining means; and
configuring said wall arrangement to respond with selective reflectivity to said first fraction of the heating arrangement radiated energy and said second fraction of the treatment object radiated energy.
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137. A system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, said system comprising:
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a heating arrangement for heating the treatment object using a heating arrangement radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object;
sensing means for sensing the treatment object radiated energy at a sensing wavelength; and
chamber defining means for exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within a treatment chamber, at least one portion of said chamber defining means configured for simultaneously (i) responding in a first way to a majority of the heating arrangement radiated energy that is incident thereon, (ii) responding in a second way to a majority of the treatment object radiated energy that is incident thereon and (iii) responding in a third way at the sensing wavelength. - View Dependent Claims (138, 139, 140, 141)
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142. In a system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, a method comprising:
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heating the treatment object using a heating arrangement radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object;
sensing the treatment object radiated energy at a sensing wavelength; and
configuring chamber defining means for exposing said treatment object to a portion of the heating arrangement radiated energy while supporting said treatment object within a treatment chamber, at least one portion of said chamber defining means configured for simultaneously (i) responding in a first way to a majority of the heating arrangement radiated energy that is incident thereon, (ii) responding in a second way to a majority of the treatment object radiated energy that is incident thereon and (iii) responding in a third way at the sensing wavelength. - View Dependent Claims (143, 144, 145, 146)
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147. A system for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, said system comprising:
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a heating arrangement for heating the treatment object using a heating arrangement radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object;
sensing means for sensing the treatment object radiated energy emitted by said treatment object at a sensing wavelength; and
chamber defining means for exposing said treatment object to the heating arrangement radiated energy while supporting said treatment object within a treatment chamber, at least a first portion of said chamber defining means configured for reflecting a majority of the sensing wavelength that is incident thereon, and at a second, different portion of the chamber defining means configured for selectively absorbing a majority of the sensing wavelength that is incident thereon. - View Dependent Claims (148, 149, 150, 151, 152)
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153. In a system for processing a treatment object having an given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy, a method comprising:
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heating the treatment object using a heating arrangement producing a heating arrangement radiated energy having a heat source emission spectrum at a heat source operating temperature which heat source emission spectrum is different from said given emission spectrum of the treatment object;
providing sensing means for sensing the treatment object radiated energy emitted by said treatment object at a sensing wavelength; and
configuring chamber defining means for exposing said treatment object to the heating arrangement radiated energy while supporting said treatment object within a treatment chamber, at least a first portion of said chamber defining means configured for reflecting a majority of the sensing wavelength that is incident thereon, and at a second, different portion of the chamber defining means configured for selectively absorbing a majority of the sensing wavelength that is incident thereon. - View Dependent Claims (154, 155, 156, 157, 158)
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160. A system for processing a treatment object, said system comprising:
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a heating arrangement for heating the treatment object using a heating arrangement radiated energy; and
chamber defining means for exposing said treatment object therein to one portion of the heating arrangement radiated energy while another portion of the heating arrangement radiated energy is incident on the chamber defining means, resulting in an overall radiated energy present within the chamber defining means, said chamber defining means including a window between said heating arrangement and said treatment object such that the window is opaque, at least to an approximation, at wavelengths longer than an opacity onset wavelength, at least a portion of said chamber defining means including a selectively reflective configuration which responds in a first way to a majority of said overall radiated energy incident thereon which is of a shorter wavelength than said opacity onset wavelength while responding in a second way to a majority of the overall radiated energy that is incident thereon and which is of a longer wavelength than said opacity onset wavelength. - View Dependent Claims (161, 162, 163)
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164. In a system for processing a treatment object, a method comprising:
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providing a heating arrangement for heating the treatment object; and
configuring chamber defining means for exposing said treatment object therein to one portion of the heating arrangement radiated energy while another portion of the heating arrangement radiated energy is incident on the chamber defining means, resulting in an overall radiated energy present within the chamber defining means, said chamber defining means including a window between said heating arrangement and said treatment object such that the window is opaque, at least to an approximation, at wavelengths longer that an onset of opacity wavelength, at least a portion of said chamber defining means including a selectively reflective configuration which responds in a first way to majority of said overall radiated energy incident thereon which is of a shorter wavelength than said opacity onset wavelength while responding in a second way to a majority of the overall radiated energy that is incident thereon and which is of a longer wavelength than said onset of opacity wavelength. - View Dependent Claims (165, 166, 167)
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Specification