Vertical charge control semiconductor device with low output capacitance
First Claim
Patent Images
1. A MOSFET comprising:
- at least two insulation-filled trench regions laterally spaced in a first semiconductor region to form a drift region therebetween; and
at least one resistive element located along an outer periphery of each of the two insulation-filled trench regions, wherein a ratio of a width of each of the insulation-filled trench regions to a width of the drift region is adjusted so that an output capacitance of the MOSFET is minimized.
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Abstract
In accordance with an embodiment of the present invention, a MOSFET includes at least two insulation-filled trench regions laterally spaced in a first semiconductor region to form a drift region therebetween, and at least one resistive element located along an outer periphery of each of the two insulation-filled trench regions. A ratio of a width of each of the insulation-filled trench regions to a width of the drift region is adjusted so that an output capacitance of the MOSFET is minimized.
106 Citations
18 Claims
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1. A MOSFET comprising:
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at least two insulation-filled trench regions laterally spaced in a first semiconductor region to form a drift region therebetween; and
at least one resistive element located along an outer periphery of each of the two insulation-filled trench regions, wherein a ratio of a width of each of the insulation-filled trench regions to a width of the drift region is adjusted so that an output capacitance of the MOSFET is minimized.
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2. A MOSFET comprising:
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a first semiconductor region having a first surface; and
first and second insulation-filled trench regions each extending from the first surface into the first semiconductor region, each of the first and second insulation-filled trench regions having an outer layer of silicon of a conductivity type opposite that of the first semiconductor region, wherein the first and second insulation-filled trench regions are spaced apart in the first semiconductor region to form a drift region therebetween, the volume of each of the first and second trench regions being greater than one-quarter of the volume of the drift region. - View Dependent Claims (3, 4, 5, 6, 7)
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8. A MOSFET comprising:
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a first semiconductor region over a substrate, the first semiconductor region having a first surface; and
first and second insulation-filled trench regions each extending from the first surface to a predetermined depth within the first semiconductor region, each of the first and second insulation-filled trench regions having an outer layer of doped silicon material which is discontinuous along a bottom surface of the insulation-filled trench region so that the insulation material along the bottom surface of the insulation-filled trench region is in direct contact with the first semiconductor region, the outer layer of silicon material being of a conductivity type opposite that of the first semiconductor region. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification