Spatial light modulator, lithographic apparatus and device manufacturing method

• US 20050024613A1
• Filed: 06/25/2004
• Published: 02/03/2005
• Est. Priority Date: 06/30/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan
• Granted Patent: US 7,154,587 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A spatial light modulator used to pattern a radiation beam comprises an array of pixels disposed on a support. Each pixel has a light modulating element for modulating the radiation beam and a control circuit that positions the light modulating elements according to a desired pattern. The control circuit is disposed on the opposite side of the support than the light modulating elements. The control circuit comprises at least one of a digital to analog converter, an analog to digital converter, an optical fiber input, and a processor.

Claims

1. A spatial light modulator, comprising:

an array of pixels disposed on a support, each pixel in the array of pixels having a light modulating element that modulates an incident radiation beam; and

a control circuit that positions the light modulating elements according to a desired pattern, the control circuit coupled to an opposite side of said support than said light modulating elements,

wherein said control circuit comprises at least one of;

a digital-to-analog converter,

an analog-to-digital converter,

an optical fiber input, and

a plurality of processors.

2. The spatial light modulator of claim 1, wherein said control circuit decompresses compressed pattern data received form an external source.

3. The spatial light modulator of claim 1, wherein said control circuit calibrates each of the pixels of the array of pixels.

4. A lithographic projection apparatus, comprising:

a radiation system that provides a projection beam of radiation;

an array of pixels disposed on a support, each pixel in the array of pixels having a light modulating element that modulates the projection beam;

a control circuit that positions the light modulating elements according to a desired pattern, the control circuit coupled to an opposite side of said support than said light modulating elements; and

a projection system that projects the patterned beam onto a target portion of a substrate,

wherein said control circuit comprises at least one of;

a digital-to-analog converter,

an analog-to-digital converter,

an optical fiber input, and

a processor.

5. The spatial light modulator of claim 4, wherein said control circuit decompresses compressed pattern data received form an external source.

6. The spatial light modulator of claim 4, wherein said control circuit calibrates each of the pixels of the array of pixels.

7. A device manufacturing method, comprising:

patterning a projection beam of radiation using an array of pixels disposed on a support, each pixel in the array of pixels having a light modulating element that modulates the projection beam;

positioning the light modulating elements according to a desired pattern using a control circuit;

coupling the control circuit to an opposite side of said support than said light modulating elements; and

projecting the patterned beam onto a target portion of a substrate using a projection system.

8. The method of claim 7, further comprising decompressing compressed pattern data received form an external source using the control circuit.

9. The method of claim 7, further comprising calibrating each of the pixels of the array of pixels using said control circuit.