Electrochemical fabrication methods with enhanced post deposition processing
First Claim
1. An electrochemical fabrication process for producing a three-dimensional structure from a pluralilty of adhered layers, the process comprising:
- (A) selectively depositing a first material onto a substrate to form a portion of a layer and depositing at least a second material to form another portion of the layer, wherein the substrate may comprise previously deposited material, and wherein one of the first material or the second material is a structural material and the other is a sacrificial material;
(B) forming a plurality of layers such that each successive layer is formed adjacent to and adhered to a previously deposited layer, wherein said forming comprises repeating operation (A) a plurality times, wherein during formation of at least one layer an adhered mask is used in selectively depositing the first material; and
(C) after formation of a plurality of layers, separating at least a portion of the sacrificial material from the structural material using an etching solution that comprises ammonium hydroxide, a chlorite salt, and a nitrate salt.
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Accused Products
Abstract
An electrochemical fabrication process for producing three-dimensional structures from a plurality of adhered layers is provided where each layer comprises at least one structural material (e.g. nickel or nickel alloy) and at least one sacrificial material (e.g. copper) that will be etched away from the structural material after the formation of all layers have been completed. An etchant containing chlorite (e.g. Enthone C-38) is combined with a corrosion inhibitor (e.g. sodium nitrate) to prevent pitting of the structural material during removal of the sacrificial material. A simple process for drying the etched structure without the drying process causing surfaces to stick together includes immersion of the structure in water after etching and then immersion in alcohol and then placing the structure in an oven for drying.
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Citations
29 Claims
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1. An electrochemical fabrication process for producing a three-dimensional structure from a pluralilty of adhered layers, the process comprising:
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(A) selectively depositing a first material onto a substrate to form a portion of a layer and depositing at least a second material to form another portion of the layer, wherein the substrate may comprise previously deposited material, and wherein one of the first material or the second material is a structural material and the other is a sacrificial material;
(B) forming a plurality of layers such that each successive layer is formed adjacent to and adhered to a previously deposited layer, wherein said forming comprises repeating operation (A) a plurality times, wherein during formation of at least one layer an adhered mask is used in selectively depositing the first material; and
(C) after formation of a plurality of layers, separating at least a portion of the sacrificial material from the structural material using an etching solution that comprises ammonium hydroxide, a chlorite salt, and a nitrate salt. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. An electrochemical fabrication process for producing a three-dimensional structure from a plurality of adhered layers, the process comprising:
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(A) selectively patterning a first material on a substrate to form a portion of a layer and depositing at least a second material to form another portion of the layer, wherein the substrate may comprise previously deposited material, and wherein one of the first material or the second material is a structural material and the other is a sacrificial material;
(B) forming a plurality of layers such that each successive layer is formed adjacent to and adhered to a previously deposited layer, wherein said forming comprises repeating operation (A) a plurality times, wherein during formation of at least one layer an adhered mask is used in selectively patterning the first material; and
(C) after formation of a plurality of layers, separating at least a portion of the sacrificial material from the structural material using an etching solution that comprises ammonium hydroxide, a chlorite salt, and a nitrate salt. - View Dependent Claims (24, 25, 26, 27, 28)
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29. An electrochemical fabrication process for producing a three-dimensional structure from a plurality of adhered layers, the process comprising:
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(A) selectively depositing a first material onto a substrate to form a portion of a layer and depositing at least a second material to form another portion of the layer, wherein the substrate may comprise previously deposited material, and wherein one of the first material or the second material is a structural material and the other is a sacrificial material;
(B) forming a plurality of layers such that each successive layer is formed adjacent to and adhered to a previously deposited layer, wherein said forming comprises repeating operation (A) a plurality times, wherein during formation of at least one layer an adhered mask is used in selectively depositing the first material; and
(C) after formation of a plurality of layers, separating at least a portion of the sacrificial material from the structural material using an etching solution that comprises a corrosion inhibitor.
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Specification