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Apparatus for measuring VS parameters in a wafer burn-in system

  • US 20050030056A1
  • Filed: 06/23/2004
  • Published: 02/10/2005
  • Est. Priority Date: 06/25/2003
  • Status: Abandoned Application
First Claim
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1. An apparatus for measuring VS parameters of semiconductor devices formed on a wafer in a wafer burn-in system, comprising:

  • an FPGA for generating control signals including a driving voltage for measuring the VS parameters;

    a D/A converter for converting the digital control signals provided from the FPGA to analog control signals and then outputting the analog control signals;

    a VS circuit provided with n same circuit blocks, which are connected one-to-one to n DUTs (Devices Under Test), photo MOSs being provided at output stages of each of the n circuit blocks, wherein the control signals provided from the D/A converter are selectively transmitted to the respective DUTs by selectively switching on/off the photo MOSs in the respective circuit blocks.

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