Liquid immersion type exposure apparatus

• US 20050030497A1
• Filed: 06/24/2004
• Published: 02/10/2005
• Est. Priority Date: 06/25/2003
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Nakamura, Takashi
• Granted Patent: US 7,116,395 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

Disclosed is a liquid immersion type exposure apparatus specifically arranged to maintain a liquid film between an exposure substrate and a terminal end portion of a projection optical system. In one preferred form, the liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.

Claims

1. A liquid immersion type exposure apparatus, comprising:

a projection optical system for projecting a pattern of a mask onto a substrate;

a liquid film forming system for forming a liquid film in a predetermined region between said projection optical system and the substrate; and

a sensor for detecting disappearance of at least a portion of the liquid film in said predetermined region.

2. An apparatus according to claim 1, further comprising a controller for estimating the position where the disappearance of liquid film has occurred, on the basis of the detection by said sensor.

3. An apparatus according to claim 2, wherein said controller is operable to discriminate whether exposures having been made to shot regions of the substrate are effective or not, on the basis of the result of estimation.

4. An apparatus according to claim 2, wherein said controller is operable to perform a process for recovering the liquid film, on the basis of the result of estimation.

5. An apparatus according to claim 1, wherein at least a portion of said sensor is disposed in a region being filled with the liquid film.

6. An apparatus according to claim 1, wherein said predetermined region includes an exposure region of the substrate.

7. A device manufacturing method, comprising the steps of:

exposing a substrate by use of an exposure apparatus as recited in claim 1;

and

developing the exposed substrate.